The dependences of the magnetic properties and morphology of polycrystalline nickel (Ni) films with the (200) texture that are fabricated using the dc magnetron sputtering on the SiO 2 /Si(100) substrates on sputtering rate annealing temperature T, and film thickness d are analyzed. It is demonstrated that an increase in the sputtering rate from 17 to 35 nm/min does not affect the saturation magnetization 4πM and ferromagnetic resonance line width ΔH but leads to a significant increase in the coercivity H c for the films whose thickness d is greater than critical thickness d cr (d > d cr ). It is also demonstrated that d cr depends on both sputtering rate and annealing temperature. The films with the thickness d > d cr exhibit the stripe domain structure whose period increases with increasing d and rate v. The annealing of the films with d ≥ 40 nm at T ≈ 200-400°C results in an increase in ΔH and H c by a factor of 2-4, an increase in 4πM by 25%, an increase in grain size ξ by a factor of 20-30, and the formation of the stripe domain structure in the films that do not exhibit such structure prior to annealing and substantial strengthening of the (200) texture.