Microstructure influenced variation in the local surface electrical heterogeneity in thickening Al-doped ZnO films: Evidence using both scanning tunnelling spectroscope and conductive atomic force microscope

Patel, Tvarit A.; Singh, Chetan C.; Panda, Emila

doi:10.1016/j.mssp.2017.11.020

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Optical and Electrical Properties1

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Cited by 7 publications

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“…At high deposition rates, short times are insufficient to produce a continuous, homogeneous film 32,35 , such that the microstructure formed tends to absorb more oxygen, causing the confinement of charge carriers and a decrease in their mobility and concentration on the surface 36 .…”

Section: Optical and Electrical Propertiesmentioning

confidence: 99%

Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature

et al. 2021

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Thin AZO films were grown by RF magnetron sputtering for different deposition times in argon plasmas. Optical, structural, and morphological properties, together with elemental composition, were studied and correlated with the observed effects on the electrical properties and compared with two models of mobility scattering (ionized impurities and grain boundaries). The results suggest that the carrier density in the studied case is limited to below 15% owing to the low ionization efficiency caused by the formation of neutral impurities as homologous phases. While the spread in the mobility during the initial stages of film growth is strongly influenced by grain boundaries, in thicker films the limitation on ion efficiency becomes more significant.

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Section: Optical and Electrical Propertiesmentioning

confidence: 99%