Microstructure, mechanical and tribological properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering

Wang, Yongjun; Li, Hongxuan; Li, Ji; Zhao, Fei; Kong, Qinghua; Wang, Yongxia; Liu, Xiaohong; Quan, Weilong; Zhou, Hang; Chen, Jianmin

doi:10.1016/j.surfcoat.2010.11.019

Cited by 63 publications

(28 citation statements)

References 36 publications

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“…Formation of larger amounts sp 2 clusters can be ascribed to the lower ion energy bombardment of growing film during the deposition process due to lack of externally applied substrate bias voltage. At floating bias voltage (* -20 V) and at longer pulse width (400 ls) where the plateau discharge region is large (comparable to dcMS), the energy of incoming ions to the substrate is not high enough to enter the sublayers of the coating material, rather those ions remain trapped onto the surface of the growing coating microstructure, which in result forms larger amount of sp 2 clusters [28]. Again, at higher pulse frequency as in this experiment (300 Hz) the frequent ion bombardment of growing coating surface elevate the surface temperature which eventually facilitates the formation of larger sp 2 clusters and coarsen the deposited coating surface [29].…”

Section: Materials Characterization Resultsmentioning

confidence: 99%

“…Wang et al [28] reported that after a certain critical bias voltage (-150 V), the adhesion between the film and substrate decreases with increasing bias voltage. They argued that adhesion depends on internal stress of the film which increases with increasing bias voltage, and they also pointed out that lower sp 3 hybridized carbon bonds, pulse bias voltage and oxygen contents in the films are responsible for lower internal stress which eventually increase the adhesion between the graphite-like carbon (GLC) film and substrate.…”

Section: State Of the Art Of A-cn X Materialsmentioning

confidence: 99%

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Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Rashid

Archenti

2018

Nanomanuf Metrol

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A thick 400-micron amorphous carbon nitride (a-CN X ) coating material was synthesized by means of plasma-enhanced chemical vapor deposition process. High-power impulse magnetron sputtering technique was used to sputter a pure graphite target plate in reactive argon (Ar), nitrogen (N 2 ) and acetylene (C 2 H 2 ) environment for depositing the composite coating. Structural and chemical/elemental composition of the a-CN X composite material was investigated by field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy and micro-Raman spectroscopy. The rootmean-square surface roughness (S q ) and structure were estimated by atomic force microscopy. Mechanical properties such as hardness and Young's modulus (Oliver-Pharr method) at room temperature were characterized by Vickers microindentation test. Operational temperature test of the deposited a-CN X coating reveals that it can withstand up to 400°C without cracking. An inverted shaker test, based on central impedance method, was adopted to investigate the dynamic damping property of the coating material, and it was found that the first bending mode damping lossfactor of the reported a-CN X coating is 0.015 ± 0.001 and corresponding loss modulus (Young's modulus multiplied by lossfactor) is 0.234 ± 0.011 GPa.

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Section: Materials Characterization Resultsmentioning

confidence: 99%

Section: State Of the Art Of A-cn X Materialsmentioning

confidence: 99%

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Rashid

Archenti

2018

Nanomanuf Metrol

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“…As far as the variation of the critical load in the adhesion scratch test as a function of the bias voltage applied to the substrate is concerned, some studies [31][32][33][34] have reported similar results. Thus, when graphite-like carbon films were fabricated by unbalanced magnetron sputtering on silicon and on stainless substrates, [35] the critical load monotonically increased from ≈5 to ≈19 N with the increase of bias voltage from 50 to 150 V, respectively. It decreased to ≈11.5 N with further increasing the bias voltage to 185 V. We also observed for TiN-MoS x coatings deposited by pulsed DC magnetron sputtering [36] that the adhesion of the film on its substrate was greatly affected by the application of a negative substrate bias voltage.…”

Section: Journal Of Adhesion Science and Technology 2373mentioning

confidence: 99%

Effects of substrate bias voltage on adhesion of DC magnetron-sputtered copper films on E24 carbon steel: investigations by Auger electron spectroscopy

Ouis

Cailler

2013

Journal of Adhesion Science and Technology

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The adhesion strength of copper thin films on E24 carbon steel substrates was studied using the scratch test via the critical load. Coatings were deposited by a DC magnetron sputtering system. All substrates were mechanically polished; some of them were directly coated and others were ion-etched by argon ions prior to deposition process. The effects of substrate negative bias voltage during the film growth were investigated. Experimental results showed that the critical load depended on the bias voltage and that the higher bias voltage, the better adhesion. It was also observed that the deposition rate of deposited films gradually decreased with the increase of the substrate bias voltage. Furthermore, the working pressure during the substrate ion bombardment etching greatly affected the critical load. Scanning electron microscopy was used to observe the scratch tracks to accurately evaluate the critical load. Substrate surface profiles obtained by a mechanical profilometer showed that the critical load increased with the increase of the surface roughness. The analysis by Auger electron spectroscopy revealed that the interface, in case of an unbiased substrate, was relatively narrow and abrupt. However, in case of a bias voltage application, the interface was wider and more diffuse. These results suggest that the mechanisms involved in critical load enhancement are due firstly to the substrate surface roughness and the substrate temperature generated by the ion bombardment, secondly to the physical mixing in the interfacial domain and the densification of the deposited material created by the bias voltage.

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“…When the C-C sp 3 bonds content of the a-C films is higher than their C@C sp 2 counterpart, they are referred to as DLC films [12]. Depending on the relative concentrations of [sp 2 ] or [sp 3 ] hybridized C atoms, a-C films possess a combination of excellent mechanical properties [13,14], low friction, good wear performance [15,16] and biocompatibility [17]. For example, Tabbal et al [13] have shown that pulsed laser deposited a-C films with a high sp 3 content of $55% exhibited hardness values as high as 47 GPa.…”

Section: Introductionmentioning

confidence: 99%

Correlation of sp2 carbon bonds content in magnetron-sputtered amorphous carbon films to their electrochemical H2O2 production for water decontamination applications

Pandiyan

Delegan

Dirany

et al. 2015

Carbon

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Microstructure, mechanical and tribological properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering

Cited by 63 publications

References 36 publications

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Effects of substrate bias voltage on adhesion of DC magnetron-sputtered copper films on E24 carbon steel: investigations by Auger electron spectroscopy

Correlation of sp2 carbon bonds content in magnetron-sputtered amorphous carbon films to their electrochemical H2O2 production for water decontamination applications

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