Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures

Guo, Hongjian; Chen, Wenyuan; Shan, Yu; Wang, Wenzhen; Zhang, Zhenyu; Jia, Junbo

doi:10.1016/j.apsusc.2015.09.061

Cited by 53 publications

(30 citation statements)

References 31 publications

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“…It can be found that the thickness of TiN layers and Ti layers all show The cross-sectional morphologies of the TiN coatings were observed by the scanning electron microscopy, as shown in Figure 8. It can be found that the thickness of TiN layers and Ti layers all show a slowly increased tendency as the substrate temperature evaluated, which may be influenced by the enhanced atoms diffusion and increased crystallite size with the higher substrate temperature [18].…”

Section: Microstructurementioning

confidence: 99%

“…Coatings 2020, 10, x FOR PEER REVIEW 9 of 15 a slowly increased tendency as the substrate temperature evaluated, which may be influenced by the enhanced atoms diffusion and increased crystallite size with the higher substrate temperature [18].…”

Section: Microstructurementioning

confidence: 99%

“…In the past few decades, various deposition techniques have been employed to prepare TiN coatings, including magnetron sputtering [16], ion beam deposition [17], pulsed laser deposition [18], and cathodic arc deposition [19], etc. Being different from the above-mentioned deposition techniques, the coatings prepared via the magnetic filtered cathodic vacuum arc (FCVA) method have specific advantages, such as denser microstructure and stronger adhesion strength [20,21], which contribute to its excellent sand erosion resistance.…”

Section: Introductionmentioning

confidence: 99%

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Investigations in Anti-Impact Performance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Method under Different Substrate Temperatures

Huang

Cao

et al. 2020

Coatings

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In this study, the anti-impact performance of the TiN coatings prepared under various substrate temperatures (35, 200, 400, and 600 °C) were evaluated using a cyclic impact tester under 104 cycles. Moreover, the microstructure and anti-impact performance-related mechanical properties (adhesion strength and nano-hardness) were investigated to reveal the underlying mechanism of how the substrate temperature affects the anti-impact performance of the coatings. The results showed that the substrate temperature has a great influence on the internal stress, nano-hardness, and adhesion strength as well as the anti-impact performance of TiN coatings, and the coatings prepared under 400 °C exhibit the best impact resistance. The small internal stress, strong adhesion strength as well as high hardness and H3/E2 value for the 400 °C prepared coatings are the main contributes.

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Section: Microstructurementioning

confidence: 99%

Section: Microstructurementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Investigations in Anti-Impact Performance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Method under Different Substrate Temperatures

Huang

Cao

et al. 2020

Coatings

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“…At 750 C, the preferred orientation was found to be (111) type. The reason for the change in orientation from (200) to (111) is associated with higher adatom mobility at a higher temperature that results in the formation of surfaces with lower surface energy [31].…”

Section: Vibration Damping Measurementsmentioning

confidence: 99%

Enhancement in corrosion resistance and vibration damping performance in titanium by titanium nitride coating

et al. 2020

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Titanium nitride (TiN) thin films are deposited on titanium (Ti) substrates by pulsed laser deposition and radio frequency magnetron sputtering. The main goal of this research is to improve the corrosion resistance and the vibration damping performance of the Ti substrates by surface modification of the substrates with TiN thin film coatings. Electrochemical results indicate that TiN films bring about a significant improvement in the corrosion resistance of the Ti disks in phosphate buffer saline solution. It is also observed that TiN deposited at room temperature has the best corrosion efficiency in terms of lower corrosion current density and more positive corrosion potential. From the damping measurements, it is observed that the damping ratios of the TiN-coated beams are one to two orders of magnitude greater than those of uncoated ones. Additionally, the damping amplitudes of the TiN coated beams have been observed to return to zero position faster than the uncoated beam. The energy dissipation due to internal friction at the beam-coating interface and inter-lamellae interface within TiN coatings can be the mechanism responsible for reducing vibration amplitudes of TiN-coated beams.

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“…The reason is because (1) it is a clean process composed of pure solid target, clean substrate, and dense ultraviolet photons only, (2) it may be possible to form a film having a similar chemical composition, and (3) the deposited film thickness can be controlled with laser pulse number basically. In contrast to predecessors in thin film generation of TiN, PLD procedure in this experiment uses a hot pressed target of TiN crystal powder to create a highly crystalline TiN thin film, which is never formed [18][19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Plasmonic Crystalline Thin Film of Titanium Nitride (TiN) by Pulsed Laser Deposition with Third Harmonic of Nd:YAG Laser and Its Spectroscopic Analyses

Oshikane¹

2017

Nanoplasmonics - Fundamentals and Applications

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The author has been engaged in the development of a novel optical fiber probe using scanning near-field optical microscope (SNOM) with an efficient, plasmonic and asymmetric Metal-Insulator-Metal (MIM) structure at the probe tip. As a metallic layer, titanium nitride (TiN), one of the alternative plasmonic materials, is selected. A pulsed laser deposition (PLD) is used to fabricate the film by high-power Nd:YAG laser. The PLDed films have been analyzed by X-ray diffractometer (XRD), UV-Vis/NIR spectrophotometer, scanning electron microscope (SEM), and X-ray photoelectron spectroscopy (XPS). Though most of previous PLD studies of TiN film used a titanium target with reactive gases, the study presented in this chapter has significant features of (1) a hot pressed target of crystalline TiN powder and (2) third harmonic of injection-seeded Nd:YAG laser which have temporally smoothed Gaussian with a constant pulse energy. The very first PLD process has succeeded to fabricate flat and dense films of a few hundred nanometers. The TiN film, which lustered like gold, indicated two peaks at 36.7° (111) and 42.6° (200) in XRD patterns that correspond to crystal structure of TiN. An elementary analysis of the TiN film has carried out using XPS, and appropriate spectra with chemical shifts were observed.Keywords: alternative plasmonic material, titanium nitride (TiN), plasmonic thin film, pulsed laser deposition (PLD), crystalline thin film, third harmonic of pulsed Nd:YAG laser, X-ray diffractometer (XRD), electromagnetic FEM simulation, X-ray photoelectron spectroscopy (XPS)

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Microstructures and properties of titanium nitride films prepared by pulsed laser deposition at different substrate temperatures

Cited by 53 publications

References 31 publications

Investigations in Anti-Impact Performance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Method under Different Substrate Temperatures

Investigations in Anti-Impact Performance of TiN Coatings Prepared by Filtered Cathodic Vacuum Arc Method under Different Substrate Temperatures

Enhancement in corrosion resistance and vibration damping performance in titanium by titanium nitride coating

Fabrication of Plasmonic Crystalline Thin Film of Titanium Nitride (TiN) by Pulsed Laser Deposition with Third Harmonic of Nd:YAG Laser and Its Spectroscopic Analyses

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