2007
DOI: 10.1016/j.tsf.2007.01.028
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Millisecond crystallization of amorphous silicon films by Joule-heating induced crystallization using a conductive layer

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Cited by 25 publications
(13 citation statements)
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“…The electric field through the conducting thin films can therefore be used to induce surface morphological changes in a thin metal film. Accelerated crystallization has been reported when a dc field is applied in conjunction with heating 25–28. This is attributable to the very high temperature generated due to Joule heating causing thermal migration of particles and their agglomeration.…”
Section: Resultsmentioning
confidence: 99%
“…The electric field through the conducting thin films can therefore be used to induce surface morphological changes in a thin metal film. Accelerated crystallization has been reported when a dc field is applied in conjunction with heating 25–28. This is attributable to the very high temperature generated due to Joule heating causing thermal migration of particles and their agglomeration.…”
Section: Resultsmentioning
confidence: 99%
“…13 A very high dc electric field has been reported earlier to give rise to rapid crystallization of thin films. 14,15 Such an electric field can generate a very high temperature, due to Joule heating causing thermal migration of particles and their agglomeration. Grain growth is usually stimulated in the presence of an electric field.…”
Section: Resultsmentioning
confidence: 99%
“…Schematic diagrams that illustrate the constitution of JIC specimens have already been reported elsewhere [5][6][7]. Using the plasma-enhanced chemical vapor deposition (PECVD) method, a SiO 2 layer (first dielectric layer) with a thickness of 300 nm was formed on a 0.7mm-thick glass substrate.…”
Section: Experimental Methodologymentioning
confidence: 99%