2008
DOI: 10.1007/s10909-007-9638-9
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Mo/Au Bilayers Deposited by Sputtering at Room Temperature for Transition Edge Sensors Fabrication

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Cited by 11 publications
(6 citation statements)
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“…We carried out PIXE experiments to detect the presence of Ar, a common impurity in coatings deposited by sputtering. The results (not shown) reveal that the Ar content in the coatings is ∼0.04%, notably lower than typical reported values (∼2%) [35,36].…”
Section: Microstructurecontrasting
confidence: 57%
“…We carried out PIXE experiments to detect the presence of Ar, a common impurity in coatings deposited by sputtering. The results (not shown) reveal that the Ar content in the coatings is ∼0.04%, notably lower than typical reported values (∼2%) [35,36].…”
Section: Microstructurecontrasting
confidence: 57%
“…No impurity traces have been detected by RBS, with the exception of an atomic percentage of argon (> 2%) [20], which appears to become higher with increasing V c . However, the density of the incorporated Ar atoms is very small that they cannot be considered to be the main factor that is responsible for the measured changes in ρ res (55% of increase between the films deposited at 248 and 965 V).…”
Section: B Normal-state Resistivitymentioning
confidence: 84%
“…thin films [1]- [20]. The most used techniques are sputtering (dc and RF) and electron-beam (e-beam) evaporation.…”
mentioning
confidence: 99%
“…Because Mo is insoluble with noble metals and Au is resistant to corrosion, we selected these materials for TES fabrication. The superconducting properties of Mo/Au bilayers have been analyzed in many laboratories [4]- [6]. The superconducting properties of Mo films, and the transparency of the S/N interface, are influenced strongly by the microfabrication process.…”
Section: A Mo/au Bilayermentioning
confidence: 99%