MOCVD of Bismuth Oxides:  Transport Properties and Deposition Mechanisms of the Bi(C₆H₅)₃ Precursor

Abstract

Deposition processes of bismuth oxides have been investigated using the Bi(C 6 H 5 ) 3 precursor. The role of the MOCVD parameters has been evaluated through the study of both the precursor sublimation and the entire CVD process depending on the temperature and the reactor environment. In the 350-450 °C range, Bi 2 O 3 deposition follows a heterogeneous pathway leading to the dissociation of Bi-phenyl bonds. O 2 plays a determining role in both the precursor decomposition and Bi 2 O 3 growth. Above 450 °C, the oxidative break-down of the aromatic ring has been also observed. The temperature effect on Bi 2 O 3 growth on platinum and iridium substrates has been investigated by grazing incident X-ray diffraction, SEM, and EDX measurements. Overall results indicate that a heterogeneous process predominantly controls the Bi 2 O 3 deposition.

MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

“…13 Similarly [Bi(o-tol) 3 ] and [Bi(ptol) 3 ] have been shown to be useful bismuth precursors for growth of bismuth oxide films. 14 However, the high thermal stability of these precursors requires high deposition temperatures and carbon contamination can be problematic.…”

Fluidized‐Bed MOCVD of Bi2O3 Thin Films from Bismuth Triphenyl under Atmospheric Pressure

“…[1] These properties make Bi 2 O 3 films well suited for many applications such as microelectronics, [2] sensor technology, [3] optical coatings, [4] and ceramic glass manufacturing. [5] Various precursors have been employed to synthesize Bi 2 O 3 films by CVD, including bismuth halides and bismuth triphenyl Bi(Ph) 3 .…”

“…[5] Various precursors have been employed to synthesize Bi 2 O 3 films by CVD, including bismuth halides and bismuth triphenyl Bi(Ph) 3 . [1,2,4,[6][7][8][9][10][11] Halides are known to be toxic and corrosive. Bi(Ph) 3 is safer and offers remarkable advantages in terms of thermal stability and clean sublimation.…”

“…Bi(Ph) 3 is safer and offers remarkable advantages in terms of thermal stability and clean sublimation. [1] Bi(Ph) 3 is solid at ambient temperature and liquefies from 80 8C. In its gaseous state, when diluted in a neutral gas such as nitrogen and in the presence of oxygen, it reacts heterogeneously with this latter, at temperatures higher than 350 8C, to form solid Bi 2 O 3 .…”

Crystalline bismuth oxide nanorods fabricated on Pt‐coated substrates using a trimethylbismuth and oxygen mixture

“…It is noteworthy that main phase of the nanorods synthesized in the present work is the tetragonal β-Bi 2 O 3 structure, whereas that in Takeyama et al's work the monoclinic α-Bi 2 O 3 structure. Bedoya et al previously reported the dependence of crystalline phase on the deposition temperature [22], revealing that the monoclinic α-Bi 2 O 3 structure is favored at higher temperature. We have fabricated the nanorods with tetragonal β-Bi 2 O 3 structure at a relatively low temperature, which is a metastable phase and will exhibit a promising ionic conductivity by the deliberate doping [23,24].…”