Model for Columnar Microstructure of Thin Solid Films

Lichter, Seth; Chen, Jyhmin

doi:10.1103/physrevlett.56.1396

Cited by 163 publications

(82 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The differences might not be attributed entirely to the deposition conditions, but also to the nonidentical step-edge shapes. The observations are in general agreement with the Lichter-Chen model on columnar layer growth, 14 which is based on finite mobility of adparticles before condensation and self-shadowing of condensation nuclei.…”

Section: Results and Discussion A Cs-tem Analysissupporting

confidence: 76%

Characterization of Mo/Si multilayer growth on stepped topographies

Boogaard

Louis

Zoethout

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

View full text Add to dashboard Cite

Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the stepedge region was studied by cross section transmission electron microscopy. A transition from a continuous-to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge.

show abstract

Section: Results and Discussion A Cs-tem Analysissupporting

confidence: 76%

Characterization of Mo/Si multilayer growth on stepped topographies

Boogaard

Louis

Zoethout

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

View full text Add to dashboard Cite

show abstract

“…The growth rate depends on the slope of the surface dh/dx. By tracing the top of an initial disturbance, a kind of column angle is obtained [25].…”

Section: Angle Dependent Growth Continuum Approachmentioning

confidence: 99%

Oblique evaporation and surface diffusion

1997

View full text Add to dashboard Cite

The special structure of obliquely evaporated films has its origin in shadowing phenomena during film growth. Because of shadowing, the film consists of bundles of inclined columns with the bundles being aligned perpendicularly to the vapour incidence direction. The column inclination angle lies between the film normal and the vapour incidence direction. Different models found in literature relating process parameters and film structure are discussed. It is found that surface diffusion plays an important role, especially with regard to the difference between random and directional surface diffusion. The latter is induced by the oblique evaporation process. A quantitative expression is given for the relation between process conditions and surface diffusion including the influence of substrate temperature, rate and contamination with residual gasses. Using these models and adding our new calculations, the relation between surface diffusion and film structure is discussed in detail and found to be consistent with measurements published in the literature. © 1997 Elsevier Science S.A.

show abstract

“…Some other models have introduced additional parameters depending on the deposition rate or the diffusivity. 20,21 However, none of them are suitable for reproducing the experimental evolution illustrated in Fig. 1: this has motivated us to develop a model that permits the calculation of ␤ as a function of the deposition pressure.…”

Section: Instituto De Ciencia De Materiales De Sevilla (Csic-mentioning

confidence: 99%

Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures

García-Martín

Álvarez

Romero‐Gómez

et al. 2010

Applied Physics Letters

View full text Add to dashboard Cite

We show that the tilt angle of nanostructures obtained by glancing angle sputtering is finely tuned by selecting the adequate argon pressure. At low pressures, a ballistic deposition regime dominates, yielding high directional atoms that form tilted nanocolumns. High pressures lead to a diffusive regime which gives rise to vertical columnar growth. Monte Carlo simulations reproduce the experimental results indicating that the loss of directionality of the sputtered particles in the gas phase, together with the self-shadowing mechanism at the surface, are the main processes responsible for the development of the columns.

show abstract

Model for Columnar Microstructure of Thin Solid Films

Cited by 163 publications

References 14 publications

Characterization of Mo/Si multilayer growth on stepped topographies

Characterization of Mo/Si multilayer growth on stepped topographies

Oblique evaporation and surface diffusion

Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures

Contact Info

Product

Resources

About