2018
DOI: 10.1002/jnm.2456
|View full text |Cite
|
Sign up to set email alerts
|

Modeling and simulation of DC and microwave characteristics of AlInN(AlGaN)/AlN/GaN MOSHEMTs with different gate lengths

Abstract: In this paper, direct current (DC) and microwave characteristics are modeled and analyzed for AlInN(AlGaN)/AlN/GaN metal-oxide-semiconductor high electron mobility transistors with different gate lengths. The 2-dimensional electron gas sheet charge density (n s ) model is developed by considering polarization effect and flat-band voltage with lowest occupied energy level (E 0 ) in the quantum well.The drain current, transconductance, and gate charge model is developed by incorporating approximation of n s as p… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 22 publications
(6 citation statements)
references
References 32 publications
0
6
0
Order By: Relevance
“…Moreover, the power capabilities of the AlInN channel device exhibit the higher saturation velocity and hence high-current gain cutoff frequency. 29…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, the power capabilities of the AlInN channel device exhibit the higher saturation velocity and hence high-current gain cutoff frequency. 29…”
Section: Resultsmentioning
confidence: 99%
“…To obtain the output characteristics, 2DEG concentration, and energy band structure of GaN/InAlN MOS-HEMT and T-gate HEMT with different biomolecules, the Schrödinger equation, Poisson's equation, and carrier continuity equation are solved by self-consistent solution [34]. The physical models used in the simulation include the polarization model, Fermi-Dirac carrier statistic model, low field mobility Model, and Shockley-Read-Hall recombination model [35,36].…”
Section: Device Structure and Theoretical Modelmentioning
confidence: 99%
“…There are many studies regarding the use of new materials and different process steps in order to have a more stabilized threshold voltage V t for a normally-off MISHEMT [3, 6, 9-11, 17, 20, 21], the implementation of different geometries [22] and multiple channels [23]. A model for the 2DEG channel density has been created [24], and the study of lowfrequency noise has also been performed [13,25,26]. Lastly, in most recent studies a 1 nm thin AlN spacer layer has been placed between the AlGaN/GaN (AlGaN/AlN/GaN) in order to increase the sheet density, mobility and decrease the sheet resistance [27].…”
Section: Introductionmentioning
confidence: 99%