it possible to collect the radiation energy outside the absorption range of the photoactive material (usually silicon) by shifting its energy to a more suitable optical region. In addition, rare-earth doped CaF 2 compounds are promising luminescent materials as phosphors and in technological applications as micro-and nanoscale thermometry for microelectronics and for biomedical assays. [4,[16][17][18] A comment deserves the CaF 2 structure, also in view of similar ionic size of the trivalent lanthanide ions, inserted as dopants, and the Ca 2+ ion. Calcium fluoride has the typical fluorite structure, following the name (fluorite) of the mineral form of CaF 2 , which is a simple cubic arrangement of anions with 50% cubic sites filled with Ca 2+ . Thus, in this structure, calcium is eight coordinated by fluoride ions, a coordination environment suitable for the lanthanide ions, being eight one of the most common coordination number for lanthanides. [19] Most of the above-mentioned applications require the calcium fluoride material in the form of thin films. Several studies are available on the deposition of CaF 2 thin films using physical vapor deposition techniques, such as sputtering, [20,21] electron beam evaporation, [22] pulsed laser deposition, [23,24] and molecular beam epitaxy. [25,26] Calcium fluoride films have also been deposited through sol-gel chemical routes using spin coating [27] or dip coating. [28] Among the chemical vapor deposition approaches, atomic layer deposition has been applied to the deposition of CaF 2 films. [29] Nevertheless, even though various deposition methods have been applied to the fabrication of CaF 2 films, a more versatile, easily scalable, fast, and industrially appealing approach is highly desirable.The metal organic chemical vapor deposition (MOCVD) has the potential advantage of being a very reliable and reproducible method for the fast production of films with high uniformity degree in both thickness and composition over large areas. In addition, note that in the case of potential integration of these layers in photovoltaic cell production, plasma-enhanced CVD is the most common fabrication method for thin film Si-based cells. [30] Calcium fluoride represents one of the most efficient hosts for up-conversion or down-conversion emissions. A simple metal organic chemical vapor deposition approach is applied to the fabrication of CaF 2 nanostructured thin films using the fluorinated "second-generation" β-diketonate compound Ca (hfa) 2 •diglyme•H 2 O as a Ca-F single-source precursor. The versatility of the process is demonstrated for the fabrication of up-converting Yb/Er or Yb/Tm codoped CaF 2 films on Si, quartz, and glass substrates. The Ln(hfa) 3 •diglyme (Ln = Tm, Er, Yb) precursors are used as sources of the doping ions. Structural, morphological, and compositional characterization of the films shows the formation of polycrystalline CaF 2 films with a very uniform surface and suitable doping. In fact, an appropriate tuning of the mixture composition, i.e., the Ca:Ln ...