Abstract:Cryogenic refrigeration and liquefaction systems require ultra-high purity refrigerants (helium, argon, hydrogen, etc.) for proper operation. Common contaminants in the refrigerant gases freeze at the operating temperatures of these systems, causing performance degradation of process equipment. Therefore, ultra-high purity refrigerant gas (1.0 ppmv or less contaminants) is often used. However, removal of low levels of moisture (10 ppmv or less) from the refrigerant gas is particularly challenging. Contaminant … Show more
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