2000
DOI: 10.1051/epjap:2000110
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Modeling of current-voltage characteristics of metal/ultra-thin oxide/semiconductor structures

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Cited by 5 publications
(14 citation statements)
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“…It shows that this current increases with decreasing oxide thickness. By taking account of the results presented in [23], we conclude that when D ox decreases, S d increases and therefore the excess current increases.…”
Section: Determination Of the Excess Current At Low Fieldsmentioning
confidence: 74%
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“…It shows that this current increases with decreasing oxide thickness. By taking account of the results presented in [23], we conclude that when D ox decreases, S d increases and therefore the excess current increases.…”
Section: Determination Of the Excess Current At Low Fieldsmentioning
confidence: 74%
“…However, we have shown in previous works [7,12,23] that on structures where the oxide thicknesses are ranging between 45 and 100 A, the behavior at low fields is different from that at high fields: -At low fields, the I-V g characteristics are of FN type and are affected by an excess current resulting from the degradation of the potential barrier at the metal/oxide interface by the presence of defects in the oxide layer. The effective area of these defects increases with the structure area.…”
Section: Introductionmentioning
confidence: 85%
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