“…The voltage dependences of SCR differential resistance are different for MIS structures with and without graded-band-gap layers. Those with 3,5,7) and capacitance ( 2,4,6,8) of MIS structure versus semiconductor near-surface layer resistance at 200 kHz, for dielectric capacitance 600 pF, bulk resistance 0 (1-4) and 210 Ω ( 5-8), semiconductor near-surface layer capacitance 1000 (1, 2, 5, 6) and 5000 pF (3,4,7,8).…”