The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 1988
DOI: 10.1007/978-1-4899-0774-5_6
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Modeling of the Oxide Growth in a Chlorine Ambient

Zhi-Min Ling
1
,
L. Dupas
2
,
K.M. De Meyer
3
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Cited by 2 publications
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