2015
DOI: 10.1016/j.measurement.2015.04.003
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Modelling and characterization of NAND flash memory channels

Abstract: The threshold voltage distribution after ideal programming in NAND flash memory cells is usually distorted by a combination of the random telegraph noise (RTN), cell-to-cell Interference (CCI), and the retention process. To decide the original bits more accurately in this scenario, a precise channel model shall be utilized on the basis of the measured threshold voltages. This paper aims to characterize these various distortions occurring in multi-level cell (MLC) flash memories. A mathematical description of t… Show more

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Cited by 12 publications
(6 citation statements)
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“…The PDF of the erased state threshold voltage is (Suh, Lim, Kim, Choi, Koh & Lim, 1995). By the ISPP technique, the threshold-voltage distribution of the k-programmed state is uniform (Dong, Pan, & Zhang, 2014;Xu, Gong, Chen, Michael & Li, 2015), whose PDF is given by…”
Section: Nand Flash Memory Channelmentioning
confidence: 99%
“…The PDF of the erased state threshold voltage is (Suh, Lim, Kim, Choi, Koh & Lim, 1995). By the ISPP technique, the threshold-voltage distribution of the k-programmed state is uniform (Dong, Pan, & Zhang, 2014;Xu, Gong, Chen, Michael & Li, 2015), whose PDF is given by…”
Section: Nand Flash Memory Channelmentioning
confidence: 99%
“…The MLC flash memory channel model in [11] is adopted here. According to [27]- [32], the read voltage of a 2-bit MLC NAND cell can be expressed by…”
Section: System Modelmentioning
confidence: 99%
“…Each program step increases the voltage level of a cell by ∆V pp , which is significantly smaller than the actual voltage levels representing memory values. The voltage raise due to a single program step can be modeled [26] by adding a uniform random variable in the range of 0, ∆V pp . The program process that includes a sequence of L program steps is thereby modeled by the sum of L such uniform random variables, giving the well-known Gaussian shaped voltage level distributions, when L 1. , where α is the capacitance ratio between the two cells and ∆V pp is the ISPP voltage step.…”
Section: B Ici Analysismentioning
confidence: 99%
“…Proof: The ICI noise is the sum of L independent random variables U i uniformly distributed over 0, ∆V pp multiplied by the capacitance coupling α [26].…”
Section: B Ici Analysismentioning
confidence: 99%