Modelling the RF source in GDOES

“…It combines a simplified equivalent circuit of GD plasma with stray capacitance, cable, matching box, and rf generator. As a test of the model these plasma resistances are used as emission yield corrections in a multi-matrix calibration; they led to results similar to those obtained by use of dc-bias voltage corrections [21].…”

Section: Modelling Radiofrequency Glow Dischargesmentioning

confidence: 88%

“…An electrical model of the impedance-matched rf source has also been produced, to enable calculation of plasma resistance based on the matching box settings [21]. It combines a simplified equivalent circuit of GD plasma with stray capacitance, cable, matching box, and rf generator.…”

Section: Modelling Radiofrequency Glow Dischargesmentioning

confidence: 99%

Radiofrequency glow-discharge devices for direct solid analysis

Pisonero

Costa

Pereiro

et al. 2004

Analytical and Bioanalytical Chemistry

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The enormous potential of radiofrequency glow discharges (rf-GD) as photon, atom, or ion sources, coupled to spectrometric techniques, for rapid direct analysis of almost any conductor, semiconductor, or insulating material with good in-depth resolution has been demonstrated world-wide. This outstanding performance has prompted a great effort to develop and characterise rf-GD for direct materials analysis in recent years. The state of the art of rf-GD coupled to atomic absorption spectrometry, optical emission spectrometry, and mass spectrometry for direct solid analysis is reviewed here. A description of the principles of operation of the rf-GD and attempts to model these discharges are also given. Rf-GD instrumentation, both developed at research laboratories and commercially available, is described. Several practical examples are given demonstrating the capabilities of these techniques for bulk and depth-profile analysis. Finally, the research gaps to be filled for full implementation of rf-GD spectrometric techniques in industry and research centres alike for materials science studies and technical development are discussed.

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“…operation, the plasma resistance can be determined from the settings of the matching box. 15 There is still much work to be done in this direction, but if successful it offers the possibility for using Eqn. (9) for both conductive and non-conductive samples.…”

Section: Relative Emission Yieldmentioning

confidence: 99%

New aspects of quantification in r.f. GDOES

Payling

Michler

Aeberhard

et al. 2003

Surface & Interface Analysis

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Quantification algorithms for radiofrequency glow discharge optical emission spectroscopy (r.f. GDOES) calibration and analysis are briefly reviewed. These include corrections for emission yield, self-absorption, spectral interferences and relative sputtering rates. The emission yield term is then expanded to allow variable power calibration. The use of sputter factors to determine relative sputtering rates is explored. Finally, pulsed r.f. operation is considered and compared with continuous power operation in an alloy steel calibration and in the qualitative depth profile of a heat-sensitive coated glass.

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Modelling the RF source in GDOES

Cited by 15 publications

References 13 publications

Electrical measurements at radio frequency glow discharges for spectroscopy

Electrical measurements at radio frequency glow discharges for spectroscopy

Radiofrequency glow-discharge devices for direct solid analysis

New aspects of quantification in r.f. GDOES

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