Modern Electroplating

Lowenheim, Frederick A.; Schaefer, Ralph A.

doi:10.1149/1.2402355

Cited by 122 publications

(141 citation statements)

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“…In the presence of NaOH exclusively, Ni(OH)2 precipitation occurs at pH > 8. The importance of ammonia can be explained on the basis of the formation of nickel ammonia complexes [7].…”

Section: Discussionmentioning

confidence: 99%

Electrochemical reduction of nickel ions from dilute solutions

Njau

Janssen

1995

J Appl Electrochem

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Electrochemical reduction of nickel ions in dilute solution using a divided GBC-cell is of interest for purification of waste waters. A typical solution to be treated is the effluent from steel etching processes which contain low quantities of nickel, chromate and chromium ions. Reduction of chromate in a divided GBC-cell results in effluent containing Cr 3+ ions. This paper examines the limitations to further treatment of the effluent by electrochemical reduction of nickel ions. Nickel current efficiency has been determined by varying temperature, pH, current density and concentration of supporting electrolyte. It was found that the presence of a complexing agent, e.g. NH~-is necessary. To deposit nickel, complete removal of Cr 3+ ions from the solution is inevitable. Optimum nickel current efficiencies are obtained at pH 5 and current density 10 mA cm -2.

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“…In the presence of NaOH exclusively, Ni(OH)2 precipitation occurs at pH > 8. The importance of ammonia can be explained on the basis of the formation of nickel ammonia complexes [7].…”

Section: Discussionmentioning

confidence: 99%

Electrochemical reduction of nickel ions from dilute solutions

Njau

Janssen

1995

J Appl Electrochem

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“…Tahap ini menjadi sangat penting karena, proses elektrodeposisi lebih dari satu logam secara bersamaan lebih rumit untuk dikontrol jika dibandingkan dengan elektrodeposisi logam tunggal [5]. Salah satu faktor yang penting untuk dipertimbangkan adalah potensial coelektrodeposisi yang harus digunakan, karena masing-masing logam memiliki potensial reduksi standar yang berlainan.…”

Section: Pendahuluanunclassified

Kajian Cyclic Voltammetry Pengaruh Surfaktan Glucopone 215 Csup Dalam Elektrolit Sulfat

Budi¹,

Purwanto²,

Daud³

2017

jrskt

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AbstrakSurfaktan dapat digunakan sebagai aditif yang dapat mengontrol dan memodifikasi proses pertumbuhan partikel yang dipreparasi dengan metode deposisi elektrokimia. Kajian pendahuluan terhadap pengaruh penggunaan surfaktan Glucopone 215 CSUP terhadap karakteristik elektrokimia elektrolit sulfat telah dilakukan menggunakan teknik cyclic voltammetry. Hasil pengukuran menggunakan tensiometer menunjukkan bahwa ion-ion dari elektrolit tidak menimbulkan perbedaan signifikan terhadap critical micelle concentration (CMC) surfaktan yang dikaji. Pengaruh penambahan surfaktan Glucopone 215 CSUP terhadap cyclic voltammogram teramati ketika konsentrasi surfaktan diatas nilai CMC-nya. Katodik scan dari cyclic voltammogram menunjukkan bahwa pada konsentrasi diatas surfaktan, 1,3 wt.%, titik kenaikan arus katodik bergeser ke potensial yang semakin negatif. Hasil ini memberikan informasi potensial co-electrodeposisi yang sesuai untuk Co, Ni, dan Cu yang dipreparasi dari elektrolit sulfat dengan menggunakan aditif Glucopone 215 CSUP.

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“…Prior studies have shown that Cu-Zn alloys containing 40-99% of copper [7] can be obtained from pyrophosphate electrolytes. Deposits have been found to be coherent, smooth and fine grained.…”

Section: The Copper-zinc Electrodeposition Systemmentioning

confidence: 99%

“…The solution must contain an excess of complexant, namely potassium pyrophosphate for successful complexation of the metallic ions and to increase electrical conductivity. It is critical to maintain the ratio of pyrophosphate to metal ion concentration above 7:1, because if the ratio falls below this level the bath becomes unstable [7]. Nitrate ions are also added to the electrolyte because it acts as a proton acceptor.…”

Section: The Copper-zinc Electrodeposition Systemmentioning

confidence: 99%

Electrodeposition of Thin Film Cu-Zn Shape Memory Alloys

Page

Roy

1997

J. Phys. IV France

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Cu-Zn alloys have been electrodeposited from a pyrophosphate electrolyte containing Cu 2 P20 7> Zn 2 P 2 0 7 salts and an excess of K4P2O7 and KN0 3 . Current-potential data for both copper and zinc, as well their plating current efficiencies were determined from electrochemical polarisation experiments. Copper deposition commenced at potentials below -0.208 V whereas zinc was deposited only below -1.157 V. The current efficiencies for both metals were found to be low; typically 20-50% for copper and 5-10% for zinc. Although the potentials for electroreduction for the two components are disparate, alloys of brass containing 30-50 %Cu were successfully produced with a current efficiency of 20%. Brass foils as thin as lOum were produced by this method. The deposits were found to consist predominantly of a and P phases. It was found brass deposition on a copper substrate was preceded by a 1.5 urn thick CuZn 5 layer.

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Modern Electroplating

Abstract: not Available.

Cited by 122 publications

References 0 publications

Electrochemical reduction of nickel ions from dilute solutions

Electrochemical reduction of nickel ions from dilute solutions

Kajian Cyclic Voltammetry Pengaruh Surfaktan Glucopone 215 Csup Dalam Elektrolit Sulfat

Electrodeposition of Thin Film Cu-Zn Shape Memory Alloys

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