Modification of the surface of nanodisperse amorphous silica prepared by fluoride technology

This study investigated the effect of chemical etching on the surface structure and tribological behavior of silicate substrates. Silicate surfaces were etched using a mixture of nitric acid (HNO3) and ammonium bifluoride (NH4HF2) for durations ranging from 1 to 60 min. The etched surfaces were characterized using optical microscopy, scanning electron microscope, surface profilometry, water contact angle measurements, and UV-VIS spectroscopy to evaluate changes in surface morphology, roughness, wettability, and optical properties. Tribological performance was assessed using reciprocating ball-on-plate friction tests. The results showed that increasing the etching time resulted in the formation of microscale surface features, increased surface roughness, enhanced hydrophilicity, and reduced optical transmittance. The average friction coefficient decreased with an increase in the etching time up to 30 min, beyond which a slight increase was observed. The 1-minute etched specimen exhibited the best wear resistance with the narrowest wear track and the least material removal. The improved tribological performance was attributed to the formation of a stable transfer film, reduced real contact area, and entrapment of wear debris. This study highlights the potential of chemical etching as a technique to tailor the surface structure and tribological properties of silicate materials for various applications.

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Modification of the surface of nanodisperse amorphous silica prepared by fluoride technology

Cited by 2 publications

References 12 publications

Fluorination of silylated nanosilicas using c-C4F8 radiofrequency plasma

Fluorination of silylated nanosilicas using c-C4F8 radiofrequency plasma

Effects of chemical etching on surface structure and tribological behavior of silicate substrates

Contact Info

Product

Resources

About