Molecular Beam Epitaxy 2018
DOI: 10.1016/b978-0-12-812136-8.00027-x
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Molecular Beam Epitaxy of Wide Gap II−VI Laser Heterostructures

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Cited by 8 publications
(5 citation statements)
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“…The need for a low Se/Ga flux ratio is confirmed by the experimental fact that the optimum conditions for the MBE growth of GaSe on GaAs(001) substrates correspond to the nearly stoichiometric ratio between the adsorbed Ga and Se adatoms on the growth surface [ 30 , 49 , 50 ]. An analysis of the available literature data, taking into account the dependence of Se incorporation coefficient on both substrate and cracking zone temperatures of the Se valve source [ 59 ], shows that the stoichiometric conditions can be estimated as corresponding to P Se /P Ga (BEP) ~ 12 and ~ 25 at T S = 400 °C and 500 °C, respectively, if standard Ga and Se valve cracking cells with T Se (cr) = 500 °C are used as molecular beam sources [ 28 ]. In our analysis, we used the measured P Se /P Ga (BEP) flux ratios needed to obtain a relatively smooth GaSe surface at various temperatures (350–450 °C) from [ 30 ], where a Se valve cracking cell with T Se (cr) = 950 °C was applied as a Se source, as well as data on GaSe layers grown by MBE using standard Ga and Se cells [ 29 , 49 , 50 , 51 ].…”
Section: Resultsmentioning
confidence: 99%
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“…The need for a low Se/Ga flux ratio is confirmed by the experimental fact that the optimum conditions for the MBE growth of GaSe on GaAs(001) substrates correspond to the nearly stoichiometric ratio between the adsorbed Ga and Se adatoms on the growth surface [ 30 , 49 , 50 ]. An analysis of the available literature data, taking into account the dependence of Se incorporation coefficient on both substrate and cracking zone temperatures of the Se valve source [ 59 ], shows that the stoichiometric conditions can be estimated as corresponding to P Se /P Ga (BEP) ~ 12 and ~ 25 at T S = 400 °C and 500 °C, respectively, if standard Ga and Se valve cracking cells with T Se (cr) = 500 °C are used as molecular beam sources [ 28 ]. In our analysis, we used the measured P Se /P Ga (BEP) flux ratios needed to obtain a relatively smooth GaSe surface at various temperatures (350–450 °C) from [ 30 ], where a Se valve cracking cell with T Se (cr) = 950 °C was applied as a Se source, as well as data on GaSe layers grown by MBE using standard Ga and Se cells [ 29 , 49 , 50 , 51 ].…”
Section: Resultsmentioning
confidence: 99%
“…Taking account of difficulties in InSe/GaAs(001) heteroepitaxy, as well as the problems with high-temperature InSe growth on GaSe surface, we tried to realize the ZnSe/InSe/ZnSe quantum well (QW) heterostructures. The InSe/ZnSe looks as a promising heteropair for potential applications in the field of photonics and electronics, when taking into account the fact that the band line-up for the InSe/ZnSe interface was reported to be of strong type I [ 100 ] as well as the existence of matured MBE technology of ZnSe/GaAs(001) [ 59 ].…”
Section: Resultsmentioning
confidence: 99%
“…Moreover, after the annealing step, the temperature drops from 600 to 300 • C. This process is relatively slow and, when the growth of the ZnSe cap is resumed, it probably proceeds at a somewhat elevated temperature (≈350 • C). The likely difference in the actual growth temperature reduces the Se sticking coefficient [26,27] and the Se/Zn ratio at the surface. Therefore, as in the case of MBE grown sample a, these phenomena may also enhance the Mn segregation.…”
Section: Resultsmentioning
confidence: 99%
“…In particular, the epitaxial CdSe/Zn(S,Se) QDs have been successfully used as an active region in laser heterostructures pumped optically or by an electron beam. 1,2 Besides, they have been recognized as promising candidates for room temperature single photon emission and production of photon pairs due to strong carrier confinement and distinct biexciton performance [3][4][5] . The self-formation of these nanostructures takes place when a CdSe insertion of a fraction monolayer (ML) thickness is deposited within a Zn(S,Se) matrix.…”
Section: Introductionmentioning
confidence: 99%