Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Films

George, Steven M.; Dameron, Arrelaine A.; Du, Yiqi; Adamczyk, Nicole M.; Davidson, Stephen D.

doi:10.1149/1.2779072

Cited by 10 publications

(5 citation statements)

References 18 publications

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“…11,12 Meanwhile, in the eld of atomic layer deposition (ALD) thin-lm technology, hybrid materials have attracted growing interest in recent years due to their potential uses in many novel applications. [13][14][15][16][17][18][19] The ALD technique combined with its variant developed for the deposition of molecular species, molecular layer deposition (MLD), is particularly well suited for the fabrication of hybrid inorganicorganic thin lms because of the very high level of controllability it affords over the layer-by-layer growth mechanism and the structure of the resultant thin lm. A number of organic molecules have already been found suitable for the deposition of hybrid thin lms, [20][21][22] including hydroquinone (HQ), 23 which moreover has been shown to improve the conductivity of ZnO with certain ZnO:HQ ratios.…”

Section: Introductionmentioning

confidence: 99%

Thermoelectric characteristics of (Zn,Al)O/hydroquinone superlattices

et al. 2013

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Thin ZnO layers doped with aluminum and interspersed with regularly repeating single layers of organic molecules are deposited by a combined atomic layer deposition (ALD) and molecular layer deposition (MLD) method at 220 C using diethyl zinc, trimethyl aluminum, water and hydroquinone (HQ) as precursors. Hydroquinone is found to form distinct layers within the (Zn,Al)O framework such that clear inorganic-organic superlattice structures are realized. Aluminum doping efficiently offsets the decrease in carrier concentration caused by the organic layers, and enables enhanced electrical conductivities for the co-doped (Al plus HQ) thin films. Since superlattice structures in general are known to be highly beneficial in blocking the phonon transport in different materials, our ALD/MLD grown (Zn,Al)O:HQ thin films possess a lot of promise for new types of thermoelectrics.

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Section: Introductionmentioning

confidence: 99%

Thermoelectric characteristics of (Zn,Al)O/hydroquinone superlattices

et al. 2013

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“…Combined with the strongly emerging molecular layer deposition (MLD) technique for organics, it can be used to deposit hybrid thin lms consisting of alternating inorganic and organic layers. [5][6][7][8][9] Here we employ the combined ALD/MLD technique to deposit SL structures of (Zn,Al)O and single layers of hydroquinone (HQ).…”

mentioning

confidence: 99%

Efficiently suppressed thermal conductivity in ZnO thin films via periodic introduction of organic layers

et al. 2014

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“…There are many excellent review papers on ALD/MLD published over the years; these are collected in Table S1 (Supporting Information). [ 11,12,33,47,53,68–102 ] In the early reviews by George et al., [ 12,47 ] Lee et al., [ 87 ] and Zhou and Bent, [ 33 ] the ALD/MLD approach was thoroughly introduced. The two comprehensive accounts of the ALD/MLD precursors and processes are from the years 2014 and 2017.…”

Section: Introduction To Metal–organic Materials and Combined Atomic ...mentioning

confidence: 99%

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Films

Cited by 10 publications

References 18 publications

Thermoelectric characteristics of (Zn,Al)O/hydroquinone superlattices

Thermoelectric characteristics of (Zn,Al)O/hydroquinone superlattices

Efficiently suppressed thermal conductivity in ZnO thin films via periodic introduction of organic layers

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

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