2008
DOI: 10.1038/nnano.2008.67
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Monitoring dopants by Raman scattering in an electrochemically top-gated graphene transistor

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Cited by 3,305 publications
(4,109 citation statements)
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References 31 publications
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“…Pos(2D) ∼ 2686 cm −1 , and the 2D to G intensity and area ratios, I(2D)/I(G) and A(2D)/A(G), are 3.1 and 8.8, respectively. This indicates p-doping <100 meV, 47 confirming the electrical characterization. Further, while pristine SLG absorbs 2.3% of the incident light, 67 doping can significantly decrease the absorption by Pauli blocking.…”
supporting
confidence: 67%
“…Pos(2D) ∼ 2686 cm −1 , and the 2D to G intensity and area ratios, I(2D)/I(G) and A(2D)/A(G), are 3.1 and 8.8, respectively. This indicates p-doping <100 meV, 47 confirming the electrical characterization. Further, while pristine SLG absorbs 2.3% of the incident light, 67 doping can significantly decrease the absorption by Pauli blocking.…”
supporting
confidence: 67%
“…15 The ratio of the integrated intensity of the 2D mode compared to that of the G mode, I 2D /I G , is presented in the spatial map of Fig 3c. On the suspended portion of the sample, the 2D-mode intensity is enhanced, while the G-mode strength is not strongly affected. Consistent with studies of top-gated graphene FETs, 15 as well as with recent theoretical results suggesting a reduced intensity of the doubly resonant features in doped graphene from enhanced electron-electron scattering, 36 this ratio provides a criterion to distinguish neutral and doped graphene. We note that the absolute intensities for G-and 2D-modes measured in the free-standing and supported regions might differ simply because of an optical etalon effect associated with the different dielectric environments.…”
mentioning
confidence: 99%
“…[13][14][15][16] Our experiment did not permit us to calibrate the Raman measurements with a systematic variation of doping, since no gate was present in our sample geometry.…”
mentioning
confidence: 99%
“…and A(2D)/A(G) are 2.53 and 6.3 respectively, indicating doping∼9·10 12 cm −2 (∼290meV) [55,56,59]. We also get I(D)/I(G)∼0.14, indicating that the fabrication process does introduce significant defects in the SLG electrode [57,60].…”
Section: Introductionmentioning
confidence: 63%
“…Pos(G) is 1587.5cm −1 with FWHM(G)∼19.6cm −1 . The 2D to G peak intensity and area ratios, I(2D)/I(G) and A(2D)/A(G), are 4.32 and 7.16 respectively, suggesting a p-doping∼2.4·10 12 cm −2 (∼200meV) [55,56,59]. Fig.4a (blue curve) plots the SLG Raman spectrum after device fabrication and point-to-point subtraction of the Si reference using the same procedure.…”
Section: Introductionmentioning
confidence: 98%