2012
DOI: 10.1016/j.sna.2012.02.035
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Monocrystalline thin-film waferlevel encapsulation of microsystems using porous silicon

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Cited by 4 publications
(4 citation statements)
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“… a Porous etching of the APSM process 144 . b Rearrangement of porous silicon 144 . c Epitaxial growth of membranes 144 .…”
Section: Microsized Pressure Sensor Chipmentioning
confidence: 99%
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“… a Porous etching of the APSM process 144 . b Rearrangement of porous silicon 144 . c Epitaxial growth of membranes 144 .…”
Section: Microsized Pressure Sensor Chipmentioning
confidence: 99%
“…b Rearrangement of porous silicon 144 . c Epitaxial growth of membranes 144 . d SEM of a membrane wafer processed with the APSM process 144 .…”
Section: Microsized Pressure Sensor Chipmentioning
confidence: 99%
See 1 more Smart Citation
“…The main application during the development phase is the encapsulation of surface micro-machined structures like inertial sensors or gyroscopes on wafer level [16][17][18][19]. It is also applied as a new and effective sealing method in dye-sensitized solar cells and in some other electronic seals [20][21][22]. In terms of glass frit's application in the strain gage attachment process, Leasure et al [6] and Kim et al [7] have verified the feasibility that silicon strain gages can be bonded onto stainless steel (SS) using glass frit.…”
Section: Introductionmentioning
confidence: 99%