“…Besides, the active area patterned by these conventional methods is insufficient to be practically employed. To date, several alternative nanofabrication techniques have been reported, which relies on the following four methods: (1) selective growth on the patterned templates, 12,13 (2) reactive ion etching using patterned masks, 14,15 (3) direct removal by scanning lasers or ions, 16,17 and (4) peeling, transfer, and filling methods by controlling a surface adhesion energy. [18][19][20] In method (1), the prepared Mo nanowires were converted to MoS 2 nanowires through pyrolysis in H 2 S ambient; however, these MoS 2 nanowires exhibited unstable electrical properties owing to a Y.…”