2009
DOI: 10.1063/1.3248096
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Monte Carlo investigation of terahertz plasma oscillations in gated ultrathin channel of n-InGaAs

Abstract: By numerical simulations we investigate the dispersion of the plasma frequency in a gated channel of n-type InGaAs layer of thickness W and submicron length L at T=300 K. In the presence of a source-drain voltage and for a carrier concentrations of 1018 cm−3 the spectra evidences a peaked shape with two main bumps, the former at high frequency corresponding to the three-dimensional plasma frequency and the latter at a low frequency. The frequency value of the latter peak exhibits a dispersion as the inverse of… Show more

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Cited by 8 publications
(5 citation statements)
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“…1͒. For plasma oscillations in a FET, this equation was used by Dyakonov and Shur 1 in their original publication, and it has been recently verified by Millithaler et al 18 using Monte-Carlo calculations.…”
Section: Figmentioning
confidence: 97%
“…1͒. For plasma oscillations in a FET, this equation was used by Dyakonov and Shur 1 in their original publication, and it has been recently verified by Millithaler et al 18 using Monte-Carlo calculations.…”
Section: Figmentioning
confidence: 97%
“…Due to the nonlinear character of the current flow in HEMT channels it is possible to realize a self-control of the induced plasma wave intensity by measuring, under fixed drain current regime, the dc component of the source-drain voltage drop U sd as a function of the external signal frequency f . As it was shown in [30,31], the resonant dependence on the beating frequency of the amplitudes of both the ac and the dc components of the drain-to-source voltage drop as well as of the ac-current in the channel are identical and are practically characterized by the same FWHM. Therefore, the experimentally obtained resonant behavior of the dc component of the drain-to-source voltage drop (i.e.…”
Section: Rectification Of Induced Ac Currents In Hemt Channelmentioning
confidence: 54%
“…Mainly, this is related to the possibility of easy tuning the 2D plasma excitation spectrum inside the transistor channel by changing the external conditions, namely: gate voltage, drain voltage, operation regime, etc. [1][2][3].…”
Section: Introductionmentioning
confidence: 98%