Monte Carlo simulation of fast electrons and heavy particles in the CDS of nitrogen dc glow discharge

Yu, Wenjie; Zhang, L Z; Wang, J L; Han, Libo; Fu, Guangyan

doi:10.1088/0022-3727/34/23/305

Cited by 19 publications

(13 citation statements)

References 31 publications

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“…A Bogaerts et al have simulated capacitively coupled radio-frequency (ccrf) discharge in methane with a fluid model and have shown that calculated time-averaged CH + 5 ion density decreases with increasing flow rate [9] . The distribution of the mean density of N + ions is similar to that of N + 2 , and the density of N + is about six times less than N + 2 by our calculation, the reason for which can be found in our previous work [12] . In Fig.…”

Section: The Radial and Axial Electric Fieldsupporting

confidence: 80%

The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

Zhao¹,

Sun²,

Zhao³

et al. 2014

Plasma Sci. Technol.

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It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show that: with an increasing flow rate, the total ion (N + 2 , N +) density decreases, the mean sheath thickness becomes wider, the radial electric field in the sheath and the axial electric field show an increase, and the energies of both kinds of nitrogen ions increase; and, as the axial ion current density that is moving toward the ground electrode increases, the ion current density near the ground electrode increases. The simulation results will provide a useful reference for plasma jet technology involving rf hollow cathode discharges in N2.

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Section: The Radial and Axial Electric Fieldsupporting

confidence: 80%

The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

Zhao¹,

Sun²,

Zhao³

et al. 2014

Plasma Sci. Technol.

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“…其中，  (eV)为带电粒子能量，  (m 2 )为带电粒子的碰撞截面，由 决定 [28] ， N 0 (m -3 ) 为背景 Ar 原子的数密度。模型中设定气压 p 为 0.5 Pa，背景温度 T 为 300 K，则忽略离子半径与原子半径的差异 [31] ，因此 Ar + 和 Ar 的碰撞截面 Ar Ar    由公式( 9)…”

Section: 仿真模型的构建unclassified

High-efficient particle-in-cell/Monte Carlo model for complex solution domain andsimulation of anode layer ion source

Cui¹,

Zuo²,

Huang³

et al. 2023

Acta Phys. Sin.

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Plasma simulation is important to study the plasma discharge systematically, especially for the anode layer ion source which has the complex geometrical characteristics of the discharge structures. However, owing to the complex solution domain formed by the geometric profile of the anode and cathode, the traditional simulation models show extremely small computational efficiency and poor convergence. This paper presents a separated simulation for the ion source structure and the plasma discharge, respectively, where the cathode geometric parameters (including the size, the shape and the relative position of the inner and outer cathodes) are simplified to two magnetic mirror parameters (the magnetic mirror ratio Rm and the magnetic induction intensity at the center of the magnetic mirror B 0) firstly and a high-efficient particle-in-cell/Monte Carlo collision (PIC/MCC) model is established to improve the computational efficiency and stability of the plasma simulation later. As a result, the convergence time of the plasma simulation is shortened significantly from 1 μs to 0.45 μs, and by which the influences of the geometrical characteristics of the discharge structure on the plasma properties are systematically studied. The simulation results reveal that magnetic mirror with Rm=2.50 and B 0=36 mT can constraint the plasma at the centre zone between the inner and outer cathode. When the discharge center of the plasma is consistent with the magnetic mirror center, the anode layer ion source presents both high density output of ion beam current and significantly reduced cathode etching, suggesting the best balance obtained between the output and cathode etching.

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“…2 ) in the hollow cathode cavity are equal and uniformly distributed; the densities of atomic ions (N + ) and molecular ions (N + 2 ) are assumed to be roughly 1:5 [15] . The initial velocity of the particles is sampled from a Maxwellian velocity distribution at an average electron temperature of 2 eV and ion temperature of 0.0625 eV (300 K).…”

Section: Description Of the Modelmentioning

confidence: 99%

PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen

Han

Wang

Zhang

2016

Plasma Sci. Technol.

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A two-dimensional PIC/MCC model is developed to simulate the nitrogen radio frequency hollow cathode discharge (rf-HCD). It is found that both the sheath oscillation heating and the secondary electron heating together play a role to maintain the rf-HCD under the simulated conditions. The mean energy of ions (N + 2 , N +) in the negative glow region is greater than the thermal kinetic energy of the molecular gas (N2), which is an important characteristic of rf-HCD. During the negative portion of the hollow electrode voltage cycle, electrons mainly follow pendulum movement and produce a large number of ionization collisions in the plasma region. During the positive voltage of the rf cycle, the axial electric field becomes stronger and its direction is pointing to the anode (substrate), therefore the ions move toward the anode (substrate) via the axial electric field acceleration. Compared with dc-HCD, rf-HCD is more suitable for serving as a plasma jet nozzle at low pressure.

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Monte Carlo simulation of fast electrons and heavy particles in the CDS of nitrogen dc glow discharge

Cited by 19 publications

References 31 publications

The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

High-efficient particle-in-cell/Monte Carlo model for complex solution domain andsimulation of anode layer ion source

PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen

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