Monte Carlo simulation of secondary electron emission from an N2-adsorbed layer on a Cu surface

Hu, Xiaochuan; Zhang, Xiaowei; Zhang, Rui; Gu, Wenping

doi:10.1016/j.rinp.2020.103475

Cited by 5 publications

(8 citation statements)

References 31 publications

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“…( 28) is a constant a little larger than 1. Therefore, since λ , B, and ε are independent of E po [39][40][41] and from Eqs. ( 2), (6), and ( 28), the ratio of δ H to δ h relative to a NEASLD can be expressed as…”

Section: Relations Among Parametersmentioning

confidence: 91%

“…From Eqs. ( 2), (6), and (28), the fact that λ , B, and ε are independent of E po [39][40][41] and that K(E po , ρ, Z) at H ≥ E po ≥ h keV of a NEASLD can be approximated as a constant K(E po , ρ, Z) ChH , we can derive Eq. ( 28) with respect to E po and obtain the relationships among parameters of a NEASLD…”

Section: Relations Among Parametersmentioning

confidence: 99%

“…( 29) is n h−H (i.e., n h−H of Eq. ( 29) is a constant) and the relations among δ m , E pom , n(E pom ), and R(E pom ), [39][40][41][42] we know that when we take δ H in Eq. ( 29) to be δ m , the H, n, and R H of Eq.…”

Section: Relations Among Parametersmentioning

confidence: 99%

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Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Xie¹,

Dong²,

Liu³

2023

Chinese Phys. B

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The formulas for parameters of negative electron affinity semiconductor NEAS with large λ NEASLD are deduced, respectively, λ is the mean escape depth of secondary electrons; And the methods of obtaining parameters such as λ, B, E pom, maximum δ and δ at 100.0 keV≥E po≥1.0 keV of NEASLD with the deduced formulas are presented, respectively, where B is the probability that an internal secondary electron escapes into vacuum upon reaching the emission surface of emitter, δ is secondary electron yield, E po is incident energy of primary electron, E pom is the E po corresponding to maximum δ. The parameters obtained here were analyzed, it can be concluded that several parameters of NEASLD obtained by the methods presented here agree with those obtained by other authors. The relation between secondary electron emission and photo-emission from NEAS with large mean escape depth of excited electrons is investigated, it concludes that the presented method of obtaining λ is a more accurate method of obtaining corresponding parameter of NEAS with large λph, and that the presented method of calculating B at E po > 10.0 keV is a more widely applicable method of obtaining corresponding parameter of NEAS with large λph, λph is the mean escape depth of photo-electrons.

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Section: Relations Among Parametersmentioning

confidence: 91%

Section: Relations Among Parametersmentioning

confidence: 99%

See 1 more Smart Citation

Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Xie¹,

Dong²,

Liu³

2023

Chinese Phys. B

View full text Add to dashboard Cite

show abstract

“…The simulation of the adsorption layer portion is described in Ref. [13], which describes a three-dimensional numerical model, with which the scattering processes between electrons and adsorbed molecules is simulated. The type of scattering, energy loss, and scattering angle can be determined by the differential scattering cross section for a given incident energy and angle, which is obtained by cubic spline interpolation.…”

Section: Electron Collision Modelmentioning

confidence: 99%

“…By using the Monte Carlo method, a three-dimensional numerical model was established in Ref. [13] to simulate how electrons and molecules adhere to a surface scatter against each other.…”

Section: Introductionmentioning

confidence: 99%

Effects of O₂ adsorption on secondary electron emission properties

Yang

et al. 2023

Chinese Phys. B

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The surface adsorption of gas molecules is a key factor limiting the secondary electron yield (SEY) of a material in many areas of applied physics. This paper investigates the impact of O2 adsorption on the SEY of metallic Ag. To account for the particle distribution, we describe a B.E.T. based multilayer O2 physisorption model. Furthermore, based on the phenomenological model of secondary electron emission and taking into account the different scattering processes between electrons and particles in the adsorbed layer, we obtained a numerical model of SEY in the adsorbed state using Monte Carlo simulations. The relationship among O2 adsorption, adsorption layer thickness, and SEY variation characteristics were then examined through a series of experiments. After 12 hours of O2 exposure, it was discovered that the clean samples exhibited a 12 to 19 percent increase in the maximum value of SEY and a 2.3 nm increase in the thickness of the adsorbed layer. Experiment results were also compared to the MC model to determine if the model was accurate.

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Effective improvement of the micro-discharge threshold and environmental stability in microwave devices based on carbon/silver/titanium composite films

Zhao,

Zhou,

Meng

et al. 2024

Journal of Applied Physics

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The micro-discharge effect limits the development of high-frequency microwave power components to miniaturization and integration. Therefore, it has become a focus of research to effectively suppress the micro-discharge effect, increase the micro-discharge threshold, and strengthen the environmental stability of high-frequency microwave devices. In this study, different elemental ratios of carbon (C)/silver (Ag)/titanium (Ti) composite films were obtained by multi-target magnetron co-sputtering technology and then systematically analyzed for micro-discharge effects. When the doping ratio of C/Ag/Ti was 3.538/1/0.013, the corresponding maximum secondary electron emission coefficient (δmax) decreased to 1.01 owing to the suppression of secondary electron emission by the increase in the content of sp2 hybrid bond. The micro-discharge threshold of Ku band waveguide filters coated with moderate C/Ag/Ti composite films showed an optimal performance of 10 000−12 500 W, which was increased by approximately 20 times. Moreover, the microstructure of the composite films exhibited higher density and flatness with a tiny increase in the titanium doping ratio, representing good environmental stability. Thus, the effective suppression of the secondary electron emission yield, significant improvement in the micro-discharge threshold, and enhancement of the environment stability of microwave components could be realized simultaneously by reasonably controlling the content of titanium in silver and titanium co-doped carbon-based composite films.

show abstract

Monte Carlo simulation of secondary electron emission from an N2-adsorbed layer on a Cu surface

Cited by 5 publications

References 31 publications

Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Effects of O₂ adsorption on secondary electron emission properties

Effective improvement of the micro-discharge threshold and environmental stability in microwave devices based on carbon/silver/titanium composite films

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Monte Carlo simulation of secondary electron emission from an N2-adsorbed layer on a Cu surface

Cited by 5 publications

References 31 publications

Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Secondary electron emission and photoemission from a negative electron affinity semiconductor with large mean escape depth of excited electrons

Effects of O2 adsorption on secondary electron emission properties

Effective improvement of the micro-discharge threshold and environmental stability in microwave devices based on carbon/silver/titanium composite films

Contact Info

Product

Resources

About

Effects of O₂ adsorption on secondary electron emission properties