2001
DOI: 10.1016/s0927-0248(00)00202-6
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More stable low gap a-Si:H layers deposited by PE-CVD at moderately high temperature with hydrogen dilution

Abstract: In the present work, several series with variation of deposition parameters such as hydrogen dilution ratio, VHF-power and plasma excitation frequency f have been extensively analyzed. Compared with`conventionala more-stable layers obtained at 200}2503C and high H dilution ratios of about 10, it was observed that electrical transport properties after light-induced degradation of layers deposited at`moderately higha temperatures (300}3503C) are equivalent but required lower H dilution ratios (between 2 and 4). … Show more

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Cited by 16 publications
(9 citation statements)
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“…It is well‐established that LSM is assigned to monohydrides, while HSM is attributed to dihydrides or integrated clustered monohydrides groups at internal void surfaces . The microstructure factor R , which combines both stretching modes to describe the layer quality, is defined as: R=IHSM/()IHSM+ILSM=I2090/()I2090+I2000, …”
Section: Resultsmentioning
confidence: 93%
“…It is well‐established that LSM is assigned to monohydrides, while HSM is attributed to dihydrides or integrated clustered monohydrides groups at internal void surfaces . The microstructure factor R , which combines both stretching modes to describe the layer quality, is defined as: R=IHSM/()IHSM+ILSM=I2090/()I2090+I2000, …”
Section: Resultsmentioning
confidence: 93%
“…In Fig. 4 are also represented l 0 s R Maj and l 0 s R min products measured on various a-Si:H layers [12] in the annealed and degraded states. We remark that the l 0 s R products of lc-Si:H samples are slightly larger than those of degraded a-Si:H samples, and are approximately equal to those of annealed a-Si:H layers.…”
Section: Resultsmentioning
confidence: 99%
“…42,43 R* can be defined as the ratio of the integrated intensities of the LSM and HSM absorption bands. In other words, R* represents the ratio of the concentration of Si−H 2 bonds to the total concentration of Si−H bonds, as defined by eq 1 44,45 (…”
Section: Methodsmentioning
confidence: 99%