2014
DOI: 10.3906/fiz-1405-12
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Morphology and crystallinity control of wet chemically grown ZnO nanorods

Abstract: Abstract:The controlled growth of ZnO nanorods on technologically relevant substrates is essential for their practical integration into next generation optoelectronic and piezoelectric devices. In this report, highly ordered and uniform vertical ZnO nanorod arrays were synthesized using a facile, low temperature selective area wet chemical growth process.The nanorods were grown through nucleation windows that were patterned in a PMMA mask using electron beam lithography. At first, the technique was demonstrate… Show more

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Cited by 4 publications
(2 citation statements)
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“…The last method is the hydrothermal growth method [ 18 , 28 , 29 ]. The substrate is first magnetron-sputtered to deposit a seed layer of ZnO crystals [ 30 ] or a catalyst Au layer, and then the substrate is placed in a growth solution configured with zinc nitrate hexahydrate and hexamethylenetetramine (HMTA) for about one hour, and the substrate is placed face-down on top of the growth liquid.…”
Section: Growth Methods Of Zno Nanowiresmentioning
confidence: 99%
“…The last method is the hydrothermal growth method [ 18 , 28 , 29 ]. The substrate is first magnetron-sputtered to deposit a seed layer of ZnO crystals [ 30 ] or a catalyst Au layer, and then the substrate is placed in a growth solution configured with zinc nitrate hexahydrate and hexamethylenetetramine (HMTA) for about one hour, and the substrate is placed face-down on top of the growth liquid.…”
Section: Growth Methods Of Zno Nanowiresmentioning
confidence: 99%
“…Note that the deposited ZnO seed layer is expected to undergo epitaxial growth on the GaN layer due to a low lattice mismatch between the two. [30][31][32] A PMMA layer of thickness 420 nm was spin-coated from a 5% solution in anisole (Kayaku Advanced Materials, Japan) on top of the ZnO seed layer. The PMMA film was subsequently exposed to EBL (Elionix ELS-F125, Japan), and soaked for 60 s in a developer (Kayaku Advanced Materials, Japan) composed of methyl isobutyl ketone (MIBK) and isopropyl alcohol (IPA) with a volume ratio of 3:1.…”
Section: Preparation Of the Patterned Substratementioning
confidence: 99%