1986
DOI: 10.1016/0022-0248(86)90278-2
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MOVPE growth of beryllium-doped gallium arsenide using diethylberyllium

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Cited by 26 publications
(4 citation statements)
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“…However, we thought that the weakness of the bond provides a chance for ligand removal, to open an ether‐free pathway to beryllium dialkyl compounds. These are on the one hand still poorly characterized and on the other hand promising MOCVD doping agents for III–V semiconductors . However, for the latter application, the agents need to be oxygen‐atom‐free as the rate of oxygen integration into the semiconductor lattice is orders of magnitudes higher than for the other atoms present .…”
Section: Methodsmentioning
confidence: 99%
“…However, we thought that the weakness of the bond provides a chance for ligand removal, to open an ether‐free pathway to beryllium dialkyl compounds. These are on the one hand still poorly characterized and on the other hand promising MOCVD doping agents for III–V semiconductors . However, for the latter application, the agents need to be oxygen‐atom‐free as the rate of oxygen integration into the semiconductor lattice is orders of magnitudes higher than for the other atoms present .…”
Section: Methodsmentioning
confidence: 99%
“…The early work with atmospheric-pressure MOVPE demonstrated beryllium incorporation using diethylberyllium (DEBe) capable of achieving acceptor concentrations over 1 Â 10 20 cm -3 and producing abrupt profiles in GaAs [132,133]. The early work with atmospheric-pressure MOVPE demonstrated beryllium incorporation using diethylberyllium (DEBe) capable of achieving acceptor concentrations over 1 Â 10 20 cm -3 and producing abrupt profiles in GaAs [132,133].…”
Section: Berylliummentioning
confidence: 99%
“…Der andere Grund dafür ist die unintuitive Paarung des sehr harten Berylliumkations mit dem eher weichen Phosphoratom in Phosphanen . Unser Ansatz war jedoch, dass die schwache Bindung eine Möglichkeit zur Entfernung des Liganden birgt, um eine etherfreie Syntheseroute für Berylliumalkyle zu eröffnen, die zum einen immer noch schlecht charakterisiert sind und zum anderen vielversprechende MOCVD‐Dotierungsagentien für III‐V‐Halbleiter darstellen . Substanzen für Halbleiteranwendungen müssen sauerstaffatomfrei sein, da die Einbaurate von Sauerstoff um Größenordnungen höher ist als die der übrigen anwesenden Atome .…”
Section: Methodsunclassified