Multi-frequency response from a designed array of micromechanical cantilevers fabricated using a focused ion beam

Ghatnekar-Nilsson, Sara; Graham, Jeremy; Hull, R.; Montelius, Lars

doi:10.1088/0957-4484/17/20/031

Cited by 7 publications

(6 citation statements)

References 12 publications

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“…In the present study rectangular 10 μm × 1000 μm grooves ∼200 nm deep were machined with a commercial FEI NanoLab 600 FIB [22,23] using 30 keV Ga + ions on a polished standard doped (1 cm) Si wafer with its native oxide intact. No special pre-processing or etching was performed, only cleaning in iso-propanol and drying with a nitrogen flow to remove significant impurities.…”

Section: Methodsmentioning

confidence: 99%

Low temperature Ga surface diffusion from focused ion beam milled grooves

et al. 2009

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Ga diffusion from focused ion beam (FIB) milled grooves has been studied using x-ray photoemission electron microscopy (XPEEM) and mirror electron microscopy (MEM). We analyze the surface chemistry of the FIB structures measuring the Ga presence in the top layers of the milled grooves and morphological defects inside the grooves. The Ga is initially strictly confined to the grooves. However, annealing at temperatures as low as 150 degrees C leads to rapid and significant Ga surface diffusion from the FIB structures. The out-diffused Ga forms a thin layer extending up to several microns laterally in a non-regular pattern. The diffusion is significantly enhanced at small crystallites at the edges of the grooves. We explain the general behavior with an atomic scale model in which interstitial Ga in the milled areas diffuses out and substitutes silanol groups on the surface.

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Section: Methodsmentioning

confidence: 99%

Low temperature Ga surface diffusion from focused ion beam milled grooves

et al. 2009

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“…In the field of micromechanical sensors, the FIB offers a powerful tool for rapidly producing prototype sensors [46]. This allows complicated sensor designs to be tested and optimized before considerable resources are invested in lithographic techniques and the production of specific masks.…”

Section: Application To Sensorsmentioning

confidence: 99%

Application of Ion Beam Processes to Scanning Probe Microscopy

Slattery

Gibson

2013

Lecture Notes in Nanoscale Science and Technology

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Focused ion beam (FIB) techniques have played an important role in nanoscience over the past ~10 years, providing a versatile method of manipulating matter on the nanoscale. During this time, FIB techniques have been used to modify and enhance probes for atomic force microscopy (AFM) techniques, enabling a variety of ingenious and exciting AFM applications with specialized probes. This chapter highlights novel applications of FIB processing, where ion beam milling has been used to quantitatively and accurately determine the mechanical properties of atomic force microscope cantilevers. Several other novel contributions of FIB methods towards the field of AFM are also reviewed.

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“…In a recent paper, a novel technique was introduced that uses focused ion beam (FIB) nanomachining to fabricate NEMS out of bulk silicon substrates [17]. FIB nanomachining (for reviews see [18,19]) has been used to mill pre-existing commercially available cantilevers [20], to make devices from membranes [21], for chemical modification by local implantation for subsequent etch resistance [22] and for local doping for device electrical property variation [23]. Our technique is distinct from these other approaches in that the versatility of milling from orthogonal angles can create NEMS devices out of bulk material.…”

Section: Introductionmentioning

confidence: 99%

Optical interferometric displacement calibration and thermomechanical noise detection in bulk focused ion beam-fabricated nanoelectromechanical systems

Hiebert

Vick

Sauer

et al. 2010

J. Micromech. Microeng.

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Optical interferometric techniques are used for absolute (calibrated) displacement measurements of focused ion beam (FIB)-fabricated nanoelectromechanical systems (NEMS). FIB nanomachining of bulk Si gives rapidly prototyped cantilever and doubly clamped beam devices. Ion impingement from orthogonal directions allows tailoring of deep, undercut-free gaps between the device layer and the bulk, in turn allowing large amplitude NEMS oscillatory motion, access to a nonlinear readout regime and a new calibration method for optical interferometric displacement detection. The measurements are sensitive enough to determine the thermomechanical noise floor of a bulk FIBed NEMS device with a displacement sensitivity of 166 fm Hz − 1 2 , limited by the combination of optical shot noise and detector dark current. This sensitivity, comparable to the state of the art for free-space optical interferometry of NEMS, validates the robustness of the bulk FIB fabrication technique for rapid prototyping of nanoscale mechanical devices.

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Multi-frequency response from a designed array of micromechanical cantilevers fabricated using a focused ion beam

Cited by 7 publications

References 12 publications

Low temperature Ga surface diffusion from focused ion beam milled grooves

Low temperature Ga surface diffusion from focused ion beam milled grooves

Application of Ion Beam Processes to Scanning Probe Microscopy

Optical interferometric displacement calibration and thermomechanical noise detection in bulk focused ion beam-fabricated nanoelectromechanical systems

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