Multi-Probe Atomic Force Microscopy with Optical Beam Deflection Method

Abstract

We developed a multi-probe atomic force microscope (AFM) having two AFM cantilevers independently controlled using the optical beam deflection method. We succeeded in simultaneously obtaining images with two independent probes by frequency modulation (FM) detection method. To evaluate the distance between the AFM tips of the cantilevers, we used a new the address-patterned sample, which was also developed for this study. The images obtained show that the distance between the probes was 2 µm. The development of the multi-probe AFM opens a wide variety of applications in the present nanoscience and engineering field.

Twin‐Probe Atomic Force Microscopy with Optical Beam Deflection Using Vertically Incident Lasers by Two Beam Splitter

“…For performance evaluation of the twin probe AFM, we used the sample with address, in which the positional information is formed as graphical patterns [6][7][8]. The positional information on the x-y coordinate is denoted in binary as a specific pattern on a Si substrate by electron beam lithography and Pt sputtered film (approximately 8 nm thick).…”

“…Up to now, the multiprobe microscope using PZT thin film cantilever [5,6], the twin-probe microscope using a piezo-resistance cantilever [7], and the twin-probe atomic force microscope (AFM) introduced with the laser light oblique incidence method for the optical-lever deflection detection have been developed [8], succeeding in observing images of the surface morphology in a state in which two levers are brought to within 1 μm from each other.…”

Instrumentation for dual-probe scanning near-field optical microscopy

“…Consequently, a scanning tunneling microscope (STM), [16][17][18][19][20][21][22][23][24] an atomic force microscope (AFM), [25][26][27] and a scanning near-field optical microscope (SNOM) (Refs. 15, 28, and 29) with multiple probes have been developed to characterize the correlation between local structures and optoelectronic characteristics.…”

“…[16][17][18][19][20][21] Moreover, electron beam irradiation during SEM observations generates carriers, which make it hard to measure the intrinsic electrical properties of the sample. To compare surface morphologies obtained with two probes, 23,25,26 specific structures must be fabricated on the sample surface, and the relative position of each probe cannot be determined in real time without specific image data analysis. 23 Moreover, when the sample surface morphology is rough, the method measuring the form of the probe tip using another probe 28,29 is problematic to distinguish the surface morphology from that of the probe tip.…”

Development of dual-probe atomic force microscopy system using optical beam deflection sensors with obliquely incident laser beams

“…16 First, we developed a prototype of the DP-AFM system using the OBD method to test the possible arrangements of the optical components of the two OBD sensors a few years ago. 17 Since then, we continued developing the DP-AFM system by minimized the optical path in each OBD sensor and improving the mechanical stability and rigidity of each mechanical component. Now the DP-AFM system using the OBD method has been developed, and we recently performed an experiment on the visualization of anisotropic conductance in a polydiacetylene crystal using the system.…”