Multi-scale micro-nano structures prepared by laser cleaning assisted laser ablation for broadband ultralow reflectivity silicon surfaces in ambient air

Chen, Tong; Wang, Wenjun; Tao, Tao; Pan, An; Mei, Xuesong

doi:10.1016/j.apsusc.2019.145182

Cited by 48 publications

(28 citation statements)

References 33 publications

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“…While these studies hypothesize that roughness and surface chemistry are possible causes for the increase in absorption on aluminum, none address these important issues experimentally. Other researchers have produced similar results with moderately high absorption at normal incidence over the visible spectrum and into the IR, out to 2.5 µm, by directly laser writing a grid pattern on copper 39,40 , aluminum 37 , and silicon 38 . However, these direct laser writing methods do not lead to dynamic structures in terms of high aspect ratios and roughness that can be produced by the FLSP process.…”

Section: Introductionmentioning

confidence: 60%

“…In addition, the perfectly periodic nature required of these metamaterials is prone to fabrication imperfections, so typically high emissivity is obtained for only a narrow spectral range as compared to the broadband results that have been demonstrated using coatings or laser processing.Many previous studies have demonstrated that laser processing can be used to modify how surfaces reflect, absorb, or emit light 9,15 , including large increases in broadband absorption/emission on surfaces processed using short pulsed lasers. The surfaces are generally produced either by using femtosecond laser surface processing (FLSP) to form quasi-periodic self-organizing microstructures [33][34][35][36][37] or by directly writing pattens such as a grid or array of holes onto the surface [38][39][40][41] . However, none of these papers report surfaces with emissivity that is near perfect, omnidirectional, and broadband.…”

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confidence: 99%

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Near-unity broadband omnidirectional emissivity via femtosecond laser surface processing

et al. 2021

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It is very challenging to achieve near perfect absorption or emission that is both broadband and omnidirectional while utilizing a scalable fabrication process. Femtosecond laser surface processing is an emerging low-cost and large-scale manufacturing technique used to directly and permanently modify the surface properties of a material. The versatility of this technique to produce tailored surface properties has resulted in a rapidly growing number of applications. Here, we demonstrate near perfect, broadband, omnidirectional emissivity from aluminum surfaces by tuning the laser surface processing parameters including fluence, pulse count, and the ambient gas. Full-wave simulations and experimental results prove that the obtained increase in emissivity is mainly a result of two distinct features produced by femtosecond laser surface processing: the introduction of microscale surface features and the thick oxide layer. This technique leads to functionalized metallic surfaces that are ideal for emerging applications, such as passive radiative cooling and thermal management of spacecraft.

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Section: Introductionmentioning

confidence: 60%

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confidence: 99%

Near-unity broadband omnidirectional emissivity via femtosecond laser surface processing

et al. 2021

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“…One way to produce functionalized surfaces is by using femtosecond laser surface processing (FLSP), a unique process to directly modify the surface morphology of almost any material. Studies have demonstrated that laser processing can be used to modify how surfaces interact with electromagnetic waves to improve their broadband absorption or emission [24][25][26]. In FLSP, the material's surface properties are modified by the formation of unique micro-/nano-scale surface features, and microstructure and surface chemistry changes that alter the optical properties of the surface [27].…”

Section: Introductionmentioning

confidence: 99%

Emissivity Prediction of Functionalized Surfaces Using Artificial Intelligence

Acosta,

Reicks,

Moreno

et al. 2022

Preprint

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The radiative response of any object is governed by a surface parameter known as emissivity. Tuning the emissivity of surfaces has been of great interest in many applications involving thermal radiation such as thermophotovoltaics, thermal management systems, and passive radiative cooling. Although several surface engineering techniques (e.g., surface functionalization) have been pursued to alter the emissivity, there exists a knowledge gap in precisely predicting the emissivity of a surface prior to the modification/fabrication process. Predicting emissivity by a physics-based modeling approach is challenging due to surface's contributing factors, complex interactions and interdependence, and measuring the emissivity requires a tedious procedure for every sample. Thus, a new approach is much-needed to systematically predict the emissivity and expand the applications of thermal radiation. In this work, we demonstrate the immense advantage of employing artificial intelligence (AI) techniques to predict the emissivity of complex surfaces. For this aim, we fabricated 116 bulk aluminum 6061 samples with various surface characteristics using femtosecond laser surface processing (FLSP). A comprehensive dataset was established by collecting surface characteristic data, laser operating parameters, and measured emissivities for all samples. We demonstrated the application of AI in two distinct scenarios. First, the range of emissivity of an unknown sample was shown to be estimated correctly solely based on its 3D surface morphology image. Second,

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“…Silicon is a popular material for multiple applications involving photonics [1,2], integrated circuits [3,4], and silicon-based chips [5]. In recent decades, femtosecond lasers have proven to be a promising tool for processing silicon [6][7][8][9][10], reducing manufacturing costs, increasing efficiency, and enabling large-area processing. The contemporary femtosecond laser treatment of silicon surfaces is focused primarily on removing material using an energy higher than that required for silicon ablation threshold to ablate the material in the processing area.…”

Section: Introductionmentioning

confidence: 99%

Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets

Luo

Wen

et al. 2021

Photonics

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The ability to create controllable patterns of micro- and nanostructures on the surface of bulk silicon has widespread application potential. In particular, the direct writing of silicon oxide patterns on silicon via femtosecond laser-induced silicon amorphization has attracted considerable attention owing to its simplicity and high efficiency. However, the direct writing of nanoscale resolution is challenging due to the optical diffraction effect. In this study, we propose a highly efficient, one-step method for preparing silicon oxide nanopatterns on silicon. The proposed method combines femtosecond laser-induced silicon amorphization with a subwavelength-scale beam waist of photonic nanojets. We demonstrate the direct writing of arbitrary nanopatterns via contactless scanning, achieving patterns with a minimum feature size of 310 nm and a height of 120 nm. The proposed method shows potential for the fabrication of multifunctional surfaces, silicon-based chips, and silicon photonics.

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Multi-scale micro-nano structures prepared by laser cleaning assisted laser ablation for broadband ultralow reflectivity silicon surfaces in ambient air

Cited by 48 publications

References 33 publications

Near-unity broadband omnidirectional emissivity via femtosecond laser surface processing

Near-unity broadband omnidirectional emissivity via femtosecond laser surface processing

Emissivity Prediction of Functionalized Surfaces Using Artificial Intelligence

Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets

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