2005
DOI: 10.1063/1.2053358
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Multilayer and functional coatings on carbon nanotubes using atomic layer deposition

Abstract: Atomic layer deposition (ALD) can be used to deposit ultra-thin and conformal films on flat substrates, high aspect ratios structures and particles. In this paper, we demonstrate that insulating, multilayered and functionalized ALD coatings can also be deposited conformally on carbon nanotubes. Multilayered coatings consisting of alternating layers of dielectric and conductive materials, such as Al2O3 and W, respectively, are deposited on conductive multi-walled carbon nanotubes. This coated carbon nanotube ca… Show more

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Cited by 94 publications
(68 citation statements)
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“…ALD has been used by a few research groups to coat CNTs and CNFs. [99][100][101] ALD is particularly suited for coating large area and high aspect ratio structures because it allows atomic layer thickness control over an entire surface by a sequence of self-limiting reactions. Lee et al was first to report coating CNFs via ALD as they successfully coated bamboo-type nanofibers with Al 2 O 3 using trimethylaluminum and distilled water.…”
Section: Atomic Layer Depositionmentioning
confidence: 99%
“…ALD has been used by a few research groups to coat CNTs and CNFs. [99][100][101] ALD is particularly suited for coating large area and high aspect ratio structures because it allows atomic layer thickness control over an entire surface by a sequence of self-limiting reactions. Lee et al was first to report coating CNFs via ALD as they successfully coated bamboo-type nanofibers with Al 2 O 3 using trimethylaluminum and distilled water.…”
Section: Atomic Layer Depositionmentioning
confidence: 99%
“…Therefore, even though coaxial, nanostructured oxides such as ZnO, TiO 2, and other metal oxide mixtures have been demonstrated using nanotemplates [1], three-dimensional control of physical parameters has not been fully realized with highly precise resolution and needs to be optimized in order to achieve a wider range of potential applications. Furthermore, the combination of insulating oxides, semiconducting materials, and metals can provide the genesis for various types of novel applications and eventually provide unique and advanced levels of multifunctional nanoscale devices [2]. Recently, metal nanotubes employing platinum (Pt) have been attracting intensive interest due to their excellent electrical properties, chemical stability, and suitability for many applications in microelectronics and catalysis.…”
mentioning
confidence: 99%
“…[24][25][26][27] The defective nature of MWCNTs being synthesized in a plasma environment was reported to enhance the nucleation of ALD processes. 28 In addition, it has been demonstrated that the O 3 -based process for Al 2 O 3 using trimethylaluminum (TMA) yields a better conformality on similar CNT arrays than the TMA/H 2 O ALD process.…”
Section: Resultsmentioning
confidence: 99%