Multiphoton-Induced Decomposition of Organometallics as a Route for Production of Doped SnO2 Films

Simianu, Valerian C.; Hossenlopp, Jeanne M.

doi:10.1002/(sici)1099-0739(199702)11:2<147::aid-aoc561>3.0.co;2-r

Cited by 6 publications

(5 citation statements)

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“…The spectrum of the acid-washed film labeled 'After' in Fig. 2 resembled that reported previously 13 for films generated from DBTDA. As shown in Fig.…”

Section: Film Deposition Using 222 Nm Radiationsupporting

confidence: 83%

“…The experimental apparatus used for film deposition experiments was similar to that used for our earlier work 13 and is shown schematically in Fig. 1.…”

Section: Methodsmentioning

confidence: 99%

“…Films are typically deposited by directing a focused, pulsed, ultraviolet (UV) laser beam onto the surface of a substrate in the presence of vapor-phase precursors. This approach has only recently been applied to SnO 2 film deposition for use in gas-sensor development, 13 despite an earlier demonstration of the utility of LCVD for generating SnO 2 films. 14 Film morphology is believed to be an important factor in sensor behavior 1 and the LCVD technique offers the possibility of growing metastable film structures via rapid heating and cooling of the film during deposition.…”

Section: Introductionmentioning

confidence: 99%

“…Di-n-butyl tin diacetate (DBTDA) was used as the LCVD precursor in our first study. 13 SnO 2 films were deposited on quartz substrates from DBTDA vapor at room temperature using a focused 222 nm excimer laser beam. Films were doped by performing the same deposition procedure with lead(II) acetate trihydrate, chromium hexacarbonyl, indium(III) acetate hydrate, or copper(II) acetate vapor added to the precursor mixture.…”

Section: Introductionmentioning

confidence: 99%

“…Along with the characterization of this alternative LCVD scheme, we have also continued with our assessment of the use of copper(II) acetate as a promising dopant precursor. Use of copper as a dopant material has been motivated both by our observation of some selectivity in room-temperature sensing, 13 as well as by other general applications of CuO and copper doping as means for enhancing sensing behavior. 9,10,11 As an initial step in characterizing the LCVD process, detection of gas-phase copper atoms from the UV multiphoton dissociation of copper(II) acetate is reported here.…”

Section: Introductionmentioning

confidence: 99%

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Comparison of SnBr4 and di-n-butyl tin diacetate as laser-assisted chemical vapor deposition precursors for SnO2-based gas sensors

Hossenlopp

Lamelas

Middleton

et al. 1998

Appl. Organometal. Chem.

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Laser‐assisted chemical vapor deposition (LCVD) was utilized to produce SnO2 films from SnBr4 plus air, O2 or N2O. SnO2 films were successfully generated using either 222 or 308 nm laser pulses but there was evidence for film contamination when using less than 60 mJ/pulse laser energies at 222 nm. Films were characterized using ultraviolet absorption spectroscopy; the spectra of films with impurities resembled the spectrum of SnBr4. AFM images were obtained which indicated that this LCVD route produced small and fairly uniform SnO2 grains which were 50–100 nm in size. Multiphoton ionization spectroscopy was used to verify that the dissociation of a film dopant precursor, copper(II) acetate, produced gas‐phase copper atoms under conditions similar to those used in film deposition experiments. The deposition of SnO2 from SnBr4 plus an oxidant was found to be more efficient than from di‐n‐butyl tin diacetate but films produced via this new LCVD route, including those doped with copper, were found to be much less sensitive in preliminary gas‐sensing screening. © 1998 John Wiley & Sons, Ltd.

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“…The spectrum of the acid-washed film labeled 'After' in Fig. 2 resembled that reported previously 13 for films generated from DBTDA. As shown in Fig.…”

Section: Film Deposition Using 222 Nm Radiationsupporting

confidence: 83%

“…The experimental apparatus used for film deposition experiments was similar to that used for our earlier work 13 and is shown schematically in Fig. 1.…”

Section: Methodsmentioning

confidence: 99%