2021
DOI: 10.1021/acsnano.1c02927
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Multipulsed Millisecond Ozone Gasification for Predictable Tuning of Nucleation and Nucleation-Decoupled Nanopore Expansion in Graphene for Carbon Capture

Abstract: Predictable and tunable etching of angstrom-scale nanopores in single-layer graphene (SLG) can allow one to realize high-performance gas separation even from similar-sized molecules. We advance toward this goal by developing two etching regimes for SLG where the incorporation of angstrom-scale vacancy defects can be controlled. We screen several exposure profiles for the etchant, controlled by a multipulse millisecond treatment, using a mathematical model predicting the nucleation and pore expansion rates. The… Show more

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Cited by 24 publications
(24 citation statements)
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“…Compilation of experimentally measured H 2 /CH 4 and CO 2 /N 2 separation performances by NATMs in a selectivity‐permeance Robeson plot. The experimental results are categorized according to the perforation methods used, including ion beam bombardment (some followed by additional chemical etching), [ 150–154,156,157 ] oxidative etching, [ 143,158–166 ] and intrinsic defect formation during CVD. [ 62,143,149,159,160,164,167–171 ] The Robeson upper bounds for polymers are plotted assuming 1 µm thickness.…”
Section: Methodsmentioning
confidence: 99%
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“…Compilation of experimentally measured H 2 /CH 4 and CO 2 /N 2 separation performances by NATMs in a selectivity‐permeance Robeson plot. The experimental results are categorized according to the perforation methods used, including ion beam bombardment (some followed by additional chemical etching), [ 150–154,156,157 ] oxidative etching, [ 143,158–166 ] and intrinsic defect formation during CVD. [ 62,143,149,159,160,164,167–171 ] The Robeson upper bounds for polymers are plotted assuming 1 µm thickness.…”
Section: Methodsmentioning
confidence: 99%
“…[143,160] Since then, O 3 and oxygen plasma treatment have been frequently reported to nucleate and expand pores in NATMs. [158,162,[164][165][166] Because these oxidative etchants can participate in both pore nucleation and pore expansion, the coupling between the two processes and the subsequent wide PSD have become a concern. To address this challenge, Zhao et al developed a two-step procedure as follows.…”
Section: Oxidative Etchingmentioning
confidence: 99%
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