“…For example, a-C:H:Si:N has been produced, among others, in plasmas fed hexamethyldisilazane and nitrogen [1] , diethylsilane and ammonia [3] , and methane, silane and nitrogen [5] . Similarly, a-C:H:Si:O has been produced from plasmas of hexamethyldisiloxane (HMDSO) [9] , trimethylmethoxysilane and argon [10] , and HMDSO and argon [12] . Films of a-C:H:Si:O:N have been deposited from plasmas fed HMDSO, acetylene and nitrogen [22] , and from tetramethlydisilazane, oxygen and nitrogen [23] .…”