2015
DOI: 10.1016/j.tsf.2014.11.042
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Multiwavelength Raman analysis of SiOx and N containing amorphous diamond like carbon films

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Cited by 10 publications
(4 citation statements)
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“…In addition, in some cases in Raman scattering spectra of DLC:Si and DLC:SiO x films other transpolyacetylene-related peaks were observed [8,35,36]. Besides, the study of DLC:SiO x films by multiwavelength Raman scattering spectroscopy revealed the dependence of the spectra on excitation wavelength [39]. Transpolyacetylene-related spectral features can be seen in the case of the Raman scattering spectra excited by 633 and 785 nm wavelength light, while no transpolyacetylene related separate peaks or shoulders of the peaks were found in spectra excited by 532 nm wavelength light.…”
Section: Structurementioning
confidence: 91%
“…In addition, in some cases in Raman scattering spectra of DLC:Si and DLC:SiO x films other transpolyacetylene-related peaks were observed [8,35,36]. Besides, the study of DLC:SiO x films by multiwavelength Raman scattering spectroscopy revealed the dependence of the spectra on excitation wavelength [39]. Transpolyacetylene-related spectral features can be seen in the case of the Raman scattering spectra excited by 633 and 785 nm wavelength light, while no transpolyacetylene related separate peaks or shoulders of the peaks were found in spectra excited by 532 nm wavelength light.…”
Section: Structurementioning
confidence: 91%
“…Moreover, the presence of 2D peak is the evidence of bi-layer graphene structure and good indication of c axis ordering. Raman spectra with characteristic G and D bands are implications of defects, disorder, and carbon grain size; their intensity ratio (I(D)/I(G)) is related to the level of disorder degree and average size of sp 2 domains [12,19]. In this case, the graphene crystallite size can be calculated using Eq.…”
Section: Electrochemical Measurementsmentioning
confidence: 99%
“…Thin films of a-C:H:Si:N [1][2][3][4][5][6][7][8] , a-C:H:Si:O [9][10][11][12][13][14][15][16][17][18][19][20] , and a-C:H:Si:O:N [21][22][23][24] , where a designates amorphous, have been produced by plasma deposition from diverse monomers and comonomers. For example, a-C:H:Si:N has been produced, among others, in plasmas fed hexamethyldisilazane and nitrogen [1] , diethylsilane and ammonia [3] , and methane, silane and nitrogen [5] .…”
Section: Introductionmentioning
confidence: 99%
“…For example, a-C:H:Si:N has been produced, among others, in plasmas fed hexamethyldisilazane and nitrogen [1] , diethylsilane and ammonia [3] , and methane, silane and nitrogen [5] . Similarly, a-C:H:Si:O has been produced from plasmas of hexamethyldisiloxane (HMDSO) [9] , trimethylmethoxysilane and argon [10] , and HMDSO and argon [12] . Films of a-C:H:Si:O:N have been deposited from plasmas fed HMDSO, acetylene and nitrogen [22] , and from tetramethlydisilazane, oxygen and nitrogen [23] .…”
Section: Introductionmentioning
confidence: 99%