N-substituted hexamethyldisilazanes as new substances for the synthesis of functional films in the system Si-Ge-C-N-H

Сысоев, С. В.; Nikulina, L. D.; Kolontaeva, A. O.; Косинова, М. Л.; Titov, Aleksei A.; Rakhlin, V. I.; Tsyrendorzhieva, I. P.; Lis, A. V.; Воронков, М. Г.

doi:10.1134/s1070363211120140

Cited by 2 publications

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“…The filtrate was combined and the solvent was removed by distillation. The final product, 1,4-Bis-N,N-(trimethylsilyl)piperazine, was isolated by fractional distillation under reduced pressure (bp: 210-216 • C; mp: 23.5-24 • C; 1 H NMR (CDCl 3 ) ppm: 0.02 (9H, s, Me3Si), 2.69 (4H, s, 2CH2); 13 C NMR (CDCl3), ppm: 1.11 (Me3Si), 47.85 (CH2); 29 Si NMR (CDCl3), ppm: 5.18; MS m/z (I rel , %): 230 ([M] + , 45), 215 ([M] + -15, 30), 186 (3), 157 (15), 128 (55), 116 (52), 101 (35), 86 (35), 73 (100), 59 (30), 45 (22), 43 (10)).…”

Section: Synthesis 221 14-bis(trimethylsilyl)piperazinementioning

confidence: 99%

“…The experimental vapor pressures are listed in Table 2 and depicted in Figure 2. In order to select the impact of the structure of the molecule and its molecular mass on the volatility of the substances, the vapor pressure temperature dependence of BTMSP (M = 230 g/mol) was compared with that of the literature data of the volatility for N(SiM3)3 and PhN(SiMe3)2 with M = 233 and 237 g/mol, respectively [29,35] (Figure 2b). The data are also presented for hexamethyldisilazane (M = 161 g/mol) [29], which is the most utilized precursor for the synthesis of silicon carbonitride films.…”

Section: Volatility Of Btmspmentioning

confidence: 99%

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1,4-Bis(trimethylsilyl)piperazine—Thermal Properties and Application as CVD Precursor

et al. 2023

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We report an investigation into 1,4-Bis-N,N-(trimethylsilyl)piperazine (BTMSP) as a novel precursor for the synthesis of silicon carbonitride films by chemical vapor deposition (CVD). The thermal stability, temperature dependence of vapor pressure and thermodynamic constants of the evaporation process of BTMSP were determined by static tensimetry with a glass membrane zero manometer. The transformation of the compound in low-power (25 W) plasma conditions was investigated by optical emission spectroscopy. It was shown that BTMSP undergoes destruction, accompanied by H and CH elimination and CN formation. SiCN(H) films were deposited in a hot-wall plasma-enhanced CVD reactor. The optical properties of the films were studied by spectral ellipsometry (refractive index: 1.5–2.2; absorption coefficient: 0–0.12) and UV–Vis spectroscopy (transmittance: up to 95%; optical bandgap: 1.6–4.9 eV). Information on the aging behavior of the films is also provided. The transformation of the films occurred through water adsorption and the formation of Si–O bonds with the degradation of Si–H, N–H and Si–CHx–Si bonds.

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