Nano crystalline diamond MicroWave Chemical Vapor Deposition growth on three dimension structured silicon substrates at low temperature

Abstract

Nano crystalline diamond (NCD) films grown at a temperature below 400 °C can open new applications on temperature sensitive substrates such as polymers or low-melting point alloys. One requirement for the applicative use of NCD is the ability of depositing on structured substrate showing high aspect ratio. This work presents a study of the 3D conformity NCD deposition at low temperature (350°C) and low pressure (30 Pa). Silicon wafers have been structured using a mask-less DRIE process and seeded with nano-diamond particles. The NCD films were grown on these 3D patterned Si substrate with various trench geometries to provide means of determining the limiting geometries of this technique. By measuring the step coverage with changing trench width, a threshold for conformal NCD growth can be determined. The NCD films at the bottom of the 100 µm deep trenches were continuous down to an aspect ratio of 1:7.

Nanodiamond Coating Improves the Sensitivity and Antifouling Properties of Carbon Fiber Microelectrodes

“…More surface functional groups, such as zwitterionic groups, could be also tested to better inhibit biofouling . Future research could explore the direct fabrication of NDs , on CFME or other microelectrodes to obtain more complete surface coverage of the larger particles, to enhance sensitivity and antifouling properties.…”

Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength

“…Therefore, each wafer containing the adhesion layers was first seeded at Neo-Coat SA, using a proprietary process, by immersing the wafers in a liquid containing 10 nm diamond nanoparticles in suspension [38]. Previous investigations of the seeding density from this process on bare Si substrate showed an average cluster distance of 20 nm and surface coverage of approximately 66% [39]. Prior to NCD diamond deposition, all samples were exposed to pure H 2 plasma with increasing microwave power for approximately 1 h. The NCD diamond was deposited using a Matrix Elementary Plasma Source [40] in a home-made Matrix Elementary Plasma Source (MEPS) system using four microwaves antennas, Hi-Wave applicators from SAIREM [41], positioned in a square configuration with an axis distance of 80 mm.…”