2002
DOI: 10.1016/s0169-4332(01)00996-5
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Nanocrystalline diamond thin films deposited by 35 kHz Ar-rich plasmas

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Cited by 11 publications
(3 citation statements)
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“…Hydrocarbon/argon-rich plasmas are nowadays widely used for the synthesis of nanocarbon structures in different kinds of microwave (MW) [1][2][3] and radio-frequency (RF) [4][5][6][7] plasma reactors using hot and room temperature substrates, respectively. However, in spite of the importance of discharges in hydrocarbons for plasma processing of nanocarbon structures, the connection between fundamental plasma properties, such as the electron density or the electron temperature, and the kinetics of particle formation in such plasmas is not yet completely understood.…”
Section: Introductionmentioning
confidence: 99%
“…Hydrocarbon/argon-rich plasmas are nowadays widely used for the synthesis of nanocarbon structures in different kinds of microwave (MW) [1][2][3] and radio-frequency (RF) [4][5][6][7] plasma reactors using hot and room temperature substrates, respectively. However, in spite of the importance of discharges in hydrocarbons for plasma processing of nanocarbon structures, the connection between fundamental plasma properties, such as the electron density or the electron temperature, and the kinetics of particle formation in such plasmas is not yet completely understood.…”
Section: Introductionmentioning
confidence: 99%
“…Despite the degree of error, a significant trend was observed for both hardness and elastic modulus.The hardness and elastic modulus were shown to increase with deposition temperature. In both cases the hardness and modulus transition from values that are consistent with graphitic carbon (15 ± 10 and 450 ± 200GPa) at 600 °C to nanostructured diamond film values (32 ± 12 and 600 ± 200GPa) at 800 °C then to microcrystalline hardness and modulus (60 ± 10 and 700 ± 200) at 1000 °C [25][26][27]. Previous reported research on nanoindentation hardness and modulus of nanostructured diamond films has varied widely and is heavily dependent on the deposition method [28].…”
Section: 4nanoindentation Hardnessmentioning
confidence: 93%
“…In 1985, the work by Matsumoto et al [24] showed the first evidence of the synthesis of polycrystalline diamond films from low-pressure MW (2.45 GHz) methane/molecular hydrogen plasmas. Further investigations starting in the late 1980s up to now have shown the feasibility of using RF and MW-driven, low-pressure PECVD to produce different kinds of carbon-based nanostructures (nano [25][26][27] or ultrananoparticles, [28] nanotubes, [29] nanowalls, [30] or nanotips [30] ) from a mixture of a hydrocarbon gas (or H-free precursors like C 60 ) and other functional gases (H 2 , N 2 , NH 3 , Ar, He...). Systematic investigation of plasma polymerization started only in the 1960s after the pioneering work published by J. Goodman in 1960 [31] showing the relevant dielectric properties of one micrometer thick film of polymerized styrene deposited by plasma.…”
Section: Introductionmentioning
confidence: 99%