Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

Zhou, Ming; Roualdès, S.; Zhao, Jie; Autès, Vincent; Ayral, A.

doi:10.1016/j.tsf.2015.07.007

Cited by 20 publications

(9 citation statements)

References 36 publications

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“…Then in Figure 2.b we can see the Raman spectra for both samples with and without doping with annealing treatment at 500°C, there, a clear change in the spectra is visible. The characteristic anatase at ~145 cm -1 band is visible in both samples [21], moreover, a less intense bands at about 400 cm -1 and 640 cm -1 are observed too, these bands are related to the rutile phase [15] indicating its presence seen in XRD, and the fact that the rutile bands are less intense than the anatase phase corroborates that the samples consist mainly of anatase TiO 2 with small rutile inclusions. Again, no band related to the tungsten is seen, probably caused by the small amount of tungsten within the sample or even a great rearrangement of the sample after the W addition, or both.…”

Section: Microstructuresupporting

confidence: 62%

“…We can see a clear difference between the films with and without tungsten doping with thermal treatment, Figures 3.b and 3.d respectively. The film without tungsten doping show a brighter surface, while the other seems granular and less porous, therefore, the W addition to the film could provide it with more thermal stability [3,21]. The thickness of the films is visible in Figure 4, there we can see that both samples have less than 1 µm thick, after the annealing treatment samples rearrange into a more stable and dense structure which causes them to lose about 0.1µm of thickness.…”

Section: Morphology and Elemental Analysismentioning

confidence: 96%

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Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

et al. 2018

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Nanostructured TiO 2 and TiO 2 /W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO 2 matrix were studied by Raman spectroscopy and X-ray diffraction. Morphology and composition was studied with field emission scanning electron microscopy and optical characterization was made with UV-Vis spectroscopy. All the obtained samples presented an amorphous TiO 2 phase; however, after the annealing treatment, a crystallization process from amorphous to anatase phase occurred with gain sizes between 15.6 and 18.3 nm, additionally, a small amount of rutile was also observable. The SEM images corroborated the XRD behavior, besides it was possible to calculate the thickness of the films which was greater for the W-doped films owing the extra power of the sputtering growth, and after the samples had the thermal treatment the thickness decreased due to a more organized structure. Finally, the UV-vis transmittance analysis revealed that the transmittance is higher in heat-treated films as compared to those without any thermal treatment; also, the TiO 2 thin films showed a greater transmittance than the W doped TiO 2 films, reaching 91%. The lack of transmittance in the non-thermal-treated films made it impossible to compute the band gap of the films; nevertheless, for the thermal-treated films the band gap had a minimal change to the classic TiO 2 bang gap value, even for the W doped sample, providing them with the benefits of the tungsten within the same TiO 2 structure due to a great homogenization on the structure.

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Section: Microstructuresupporting

confidence: 62%

Section: Morphology and Elemental Analysismentioning

confidence: 96%

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

et al. 2018

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“…A study also revealed an additional feature of anatase crystal growth in PECVD: the formation of microstructure domains that the nucleation stage potentially controls. Experimentally, low-temperature (150 • C) PECVD was used to grow micro-columnar, porous TiO 2 anatase thin films on Si or glass substrates from TTIP [88]. Such a columnar morphology of thin films is beneficial for photocatalytic applications, particularly for membranes in which a high specific surface area and permeability are required.…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

“…The cauliflower-like assembly was observed when PECVD was used to prepare TiO 2 on various substrates [89,90]. In contrast to studies in which the columnar morphology was observed [88], a plasma jet was incorporated into the experimental set-up in these studies, although both growth processes were carried out at low temperatures. Therefore, the authors concluded that the cauliflower-like structures were grown from deposited TiO 2 particles produced by the titanium and oxygen reactive species that formed and collided with each other along the plasma jet [89].…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

Atmospheric Pressure Plasma Deposition of TiO2: A Review

et al. 2020

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Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

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“…Various morphologies of TiO 2 (that is nanoparticles, nanorods, and nanotubes) have been developed through several synthesis methods. These include chemical vapor deposition (CVD), sol–gel method, hydrothermal process, template synthesis, electrochemical anodic oxidation, and so on . Each synthesis route, depending on the consequent morphology of titania, might result in different photocatalytic performances.…”

Section: Introductionmentioning

confidence: 99%

Photocatalytic Properties of 1D TiO₂ Nanostructures Prepared from Polyacrylamide Gel–TiO₂ Nanopowders by Hydrothermal Synthesis

et al. 2017

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In the present study, the polyacrylamide gel (PAG) route was employed to synthesize a nanosized TiO 2 powder (PAG-TiO 2 ). The resultant PAG-TiO 2 and commercial TiO 2 (P25-TiO 2 ) nanopowders were then used as the starting materials to hydrothermally synthesize one-dimensional (1D) TiO 2 nanostructures (nanotubes and nanorods). Scanning electron microscopy (SEM), transmission electron microscopy (TEM), Brunauer-Emmett-Teller (BET) analysis, X-ray diffraction (XRD), and thermogravimetric analysis (TGA) were used to characterize the synthesized TiO 2 nanostructures. The TiO 2 nanopowders, [a]

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Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

Cited by 20 publications

References 36 publications

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

Atmospheric Pressure Plasma Deposition of TiO2: A Review

Photocatalytic Properties of 1D TiO₂ Nanostructures Prepared from Polyacrylamide Gel–TiO₂ Nanopowders by Hydrothermal Synthesis

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Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

Cited by 20 publications

References 36 publications

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering

Atmospheric Pressure Plasma Deposition of TiO2: A Review

Photocatalytic Properties of 1D TiO2 Nanostructures Prepared from Polyacrylamide Gel–TiO2 Nanopowders by Hydrothermal Synthesis

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Product

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Photocatalytic Properties of 1D TiO₂ Nanostructures Prepared from Polyacrylamide Gel–TiO₂ Nanopowders by Hydrothermal Synthesis