2019
DOI: 10.1016/j.jnucmat.2019.151770
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Nanocrystalline ZrN thin film development via atomic layer deposition for U-Mo powder

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Cited by 20 publications
(12 citation statements)
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“…These phenomena can be explained with the following three main reasons. First, as cross-sectional morphology presented in Figure 4, the three ZrN coatings can effectively prevent the corrosive medium from contacting the substrate as they are relatively dense and have a certain thickness [33]. Second, during the preparation of the ZrN monolayer, micro-pores and other defects will be formed in the layer due to the existence of the columnar crystal structure of the layer and the surface droplets [27,34].…”
Section: Discussionmentioning
confidence: 99%
“…These phenomena can be explained with the following three main reasons. First, as cross-sectional morphology presented in Figure 4, the three ZrN coatings can effectively prevent the corrosive medium from contacting the substrate as they are relatively dense and have a certain thickness [33]. Second, during the preparation of the ZrN monolayer, micro-pores and other defects will be formed in the layer due to the existence of the columnar crystal structure of the layer and the surface droplets [27,34].…”
Section: Discussionmentioning
confidence: 99%
“…5c) to form a diffusion barrier coating that could prevent the harmful interaction between the fuel and the aluminum matrix. 33 In situ heavy ion irradiation experiment showed that the ALD ZrN lm signicantly improved the irradiation stability of the fuel particles. During the extended storage process of spent nuclear fuel, helium gas accumulation from alpha decay could damage the structural integrity of the fuel.…”
Section: Stabilization and Passivation Of Particlesmentioning
confidence: 99%
“…For ZrN ALD film growth, the substrate was heated to a temperature of ~220 °C followed by a consecutive exposure of TDMAZr and NH3. This temperature has been selected based on previous work, whose details can be found in reference [9]. In between pulses purging was performed with nitrogen (N2) gas to remove residual reactants and reaction products.…”
Section: Ald Zrn Coating Processmentioning
confidence: 99%