2001
DOI: 10.1557/proc-675-w12.5.1
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Nanodevice fabrication on hydrogenated diamond surface using atomic force microscope

Abstract: Nanofabrication on a hydrogen-terminated diamond surface is performed using an atomic force microscope (AFM) anodization. Locally insulated areas less than 30 nm are successfully obtained. Side-gated field effect transistors (FETs) are fabricated using the local anodization, and they operate successfully. Single hole transistors composed of one side-gated FET and two tunneling junctions are also fabricated and operate at liquid nitrogen temperature (77 K).

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Cited by 4 publications
(3 citation statements)
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“…These states form extended 2D electronic levels. These results and recently published data by Tachiki et al 18 indicate that the narrow width of the accumulation layer at the surface gives rise to 2D properties, however further experiments are required to confirm these results.…”
supporting
confidence: 82%
“…These states form extended 2D electronic levels. These results and recently published data by Tachiki et al 18 indicate that the narrow width of the accumulation layer at the surface gives rise to 2D properties, however further experiments are required to confirm these results.…”
supporting
confidence: 82%
“…These states form an extended electronic level at the surface of hydrogenated diamond. There are indications that the narrow width of the hole accumulation layer gives rise to two-dimensional transport properties [17], however, further experiments are required to prove this assumption. …”
Section: Discussionmentioning
confidence: 99%
“…Film thickness was somewhat thinner near the wafer perimeter 15. NCD film had a thickness of ∼50–200 nm 16; µCD samples were several hundred nanometers to a few micrometers thick 17. Wafers were cut into about 17 pieces of about 1 cm 2 .…”
Section: Methodsmentioning
confidence: 99%