Nanofabrication by Charged Beams

Cui, Zheng

doi:10.1007/978-0-387-75577-9_3

Nanofabrication 2008

DOI: 10.1007/978-0-387-75577-9_3

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Nanofabrication by Charged Beams

Zheng Cui

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Cited by 2 publications

References 71 publications

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Scalable Manufacturing of Nanogaps

et al. 2018

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The ability to manufacture a nanogap in between two electrodes has proven a powerful catalyst for scientific discoveries in nanoscience and molecular electronics. A wide range of bottom-up and top-down methodologies are now available to fabricate nanogaps that are less than 10 nm wide. However, most available techniques involve time-consuming serial processes that are not compatible with large-scale manufacturing of nanogap devices. The scalable manufacturing of sub-10 nm gaps remains a great technological challenge that currently hinders both experimental nanoscience and the prospects for commercial exploitation of nanogap devices. Here, available nanogap fabrication methodologies are reviewed and a detailed comparison of their merits is provided, with special focus on large-scale and reproducible manufacturing of nanogaps. The most promising approaches that could achieve a breakthrough in research and commercial applications are identified. Emerging scalable nanogap manufacturing methodologies will ultimately enable applications with high scientific and societal impact, including high-speed whole genome sequencing, electromechanical computing, and molecular electronics using nanogap electrodes.

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Scalable Manufacturing of Nanogaps

et al. 2018

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Lithographied nanostructures as nanosensors

Guillot

Chapelle

2012

J. Nanophoton

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Major improvements in fabrication techniques at the nanoscale during the last two decades enable us to exploit and control nanoscale phenomena such as the localized surface plasmons (LSP) provided by metallic nanoparticles (MNP). The large enhancement of the electromagnetic field due to plasmonic effects increases drastically the response of any analyte located close to or adsorbed on MNPs, which opens ways for detection of very low concentration of analytes and sensor miniaturization. However, the efficiency of such nanosensors requires a precise control of the optical properties of the MNPs since it strongly depends on their geometrical properties. Such precision can be reached by nanolithography techniques. The parameters that govern the near field enhancement include the geometrical parameters of the MNPs (size, shape, and gap), the LSP characteristics (near field decay length and resonance position) and the excitation parameters (excitation wavelength and associated electric field polarization). Nanolithography techniques used for surface nanostructuring include optical, focused electron and ion beams, nanoimprint and nanosphere lithographies. Nanosensor fabricated lithographically exploit localized surface plasmon resonance, surface enhanced Raman scattering, and surface enhanced fluorescence.

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Nanofabrication by Charged Beams

Cited by 2 publications

References 71 publications

Scalable Manufacturing of Nanogaps

Scalable Manufacturing of Nanogaps

Lithographied nanostructures as nanosensors

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