Nanofabrication by Electron Beam

Improving the efficiency of upconversion by light concentration using nanoparticle design

“…A unit cell with period Λ = 780 nm was chosen based on the phase-matching criteria in (80), as this period gives the optimization freedom to trap light in the film either by coupling to a waveguide mode, exciting a plasmon resonance, or a mix of the two [70]. Using the objective function (102) and the max-min formulation in (97) without robustness (p = 1 only), the nanostructures were optimized while simultaneously considering excitation of normally incident s-and p-polarized light with wavelengths λ ∈ {1490 nm, 1500 nm, 1510 nm}. The design domain covers the unit cell in the x − y plane and is set to be 50 nm high and discretized using 5 nm wide voxels.…”

“…This interpretation forms the basis of a parameterized model used in a second optimization step using three defining parameters; the square width, the ring radius, and ring thickness. The optimization problem was set up to maximize (102) considering again the same wavelengths and polarizations, for a total of three fixed unit-cell periods Λ ∈ {780 nm, 800 nm, 1000 nm}, in the following denoted by P780, P800 and P1000, 1000 1100 1200 1300 1400 1500 1600 1700 1800 shows the concentration factor C ns from (32). In all cases, the incoming wave is a plane wave at normal incidence with the electric field along the x-direction.…”

“…For high-resolution EBL it is required to correct for proximity effect; early proximityeffect-correction (PEC) schemes date back to the 1970s [101]. The three principal PEC schemes can be classified as dose correction, pattern size compensation, and background exposure compensation [102]. Dose correction is done by modifying the electron-beam write pattern and exposure at different locations in the resist to account for exposure smearing resulting from electron scattering.…”

Interaction of Slow Electrons with Thermally Evaporated Manganese(II) Acetylacetonate Complexes

“…Nanoscale fabrication is the central theme of modern technology, and electron beam methodologies are said to be one of the most versatile techniques. , In this context, focused electron beam induced deposition (FEBID) is a promising technique for a direct three-dimensional (3D) deposition of high-purity materials. − The precursor material is deposited on a surface and is concomitantly decomposed under a focused beam of electrons in the energy range of kiloelectronvolts. During the FEBID process, both the primary particles and the secondary species, that is, ballistic low-energy (<50 eV) electrons, , act for the surface modification.…”