Nanofabrication with a helium ion microscope

Maas, D.J.; Veldhoven, E. van; Chen, Ping; Sidorkin, Vadim; Salemink, H.W.M.; Drift, E. van der; Alkemade, P.F.A.

doi:10.1117/12.862438

Cited by 47 publications

(34 citation statements)

References 20 publications

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“…15,16 However, very recently also helium ion microscopy (HIM) systems have become commercially available, using a focused He beam that has several advantages for imaging and nanostructuring, the most notable advantage being the subnanometer resolution. 17,18 In this paper, we report for the first time the use of such a focused He beam to alter magnetic properties. Using He ions, we have achieved a significantly improved control of DW injection and pinning as compared to a conventional Ga FIB.…”

Section: Introductionmentioning

confidence: 99%

Precise control of domain wall injection and pinning using helium and gallium focused ion beams

Franken

Hoeijmakers

Lavrijsen

et al. 2011

Journal of Applied Physics

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In experiments on current-driven domain wall (DW) motion in nanostrips with perpendicular magnetic anisotropy (PMA), the initial DW preparation is usually not well controlled. We demonstrate precise control of DW injection using Ga and novel He focused ion beam (FIB) irradiation to locally reduce the anisotropy in part of a Pt/Co/Pt strip. DWs experience pinning at the boundary of the irradiated area. This DW pinning is more pronounced at the He irradiation boundary compared to Ga. This is attributed to a better He beam resolution, causing an anisotropy gradient over a much smaller length scale and hence, a steeper energy barrier for the DW. The results indicate that He FIB is a useful tool for anisotropy engineering of magnetic devices in the nanometer range.

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Section: Introductionmentioning

confidence: 99%

Precise control of domain wall injection and pinning using helium and gallium focused ion beams

Franken

Hoeijmakers

Lavrijsen

et al. 2011

Journal of Applied Physics

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“…One other inspection method that is easily capable of detecting topographic features on the order of several nm is charged particle beam microscopy (SEM, HIM). A nice demonstration of the capabilities of HIM (Helium Ion Microscopy) is shown in these proceedings 13 . A logical step in the technology assessment would be to determine the detection efficiency of the defects on the reticle with either of these techniques.…”

Section: Outlook For Further Technology Assessmentmentioning

confidence: 99%

“…PMMA forms nice films of even smaller thickness 12 . In these proceedings 13 it is shown that even thinner layers of 5 nm of HSQ resist can be applied without difficulty.…”

Section: Outlook For Further Technology Assessmentmentioning

confidence: 99%

Holographic method for detecting amplitude and phase-shift errors and features in EUV ML reticle blanks

et al. 2010

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A method for actinic inspection of EUV mask blanks is described, in which EUV photoresist is applied to the blank, flood exposed with EUV, and developed. The effect of both phase and reflectivity defects on the reticle is described in terms of a variation in intensity and phase of the standing wave in the resist. Thin film simulations are performed to evaluate the contrast generating mechanism for various blank defects. The method was introduced earlier by others 3 and was shown in experiments to transfer reflectivity defects on the reticle to the developed resist. We propose to reevaluate the technique with current state-of-the-industry capabilities of resist processing, contamination control and inspection. Various possible development directions are described.

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“…9,10 Very narrow structures with almost no overspray can be made with the gas-induced deposition. 11,12 For thin-film dicing and nanopore drilling, sub-10-nm features are now achieved.…”

Section: Introductionmentioning

confidence: 99%

Novel nanosample preparation with a helium ion microscope

Rudneva

Veldhoven²,

Malladi

et al. 2013

J. Mater. Res.

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In this article, we present novel sample preparation methods using a helium ion microscope (HIM). We report the possibility of reshaping, at room temperature, thin metal lines on an electron-transparent membrane: A set of platinum bridges with standard geometry (300 Â 200 Â 15 nm) was modified at room temperature into different shapes using focused helium (He)-ion beam. Also the applicability of the HIM as a tool for precise modification of silicon (Si) and strontium titanate (SrTiO 3 ) lamellae is shown and discussed. We demonstrated that in situ heating (e.g., at 600°C) of the samples during He-beam illumination by use of a specially developed heating stage enables production of thin Si and SrTiO 3 samples without significant artifacts. The quality of such cuts was inspected by transmission electron microscopy with high-resolution imaging, and the diffraction patterns were analyzed.

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Nanofabrication with a helium ion microscope

Cited by 47 publications

References 20 publications

Precise control of domain wall injection and pinning using helium and gallium focused ion beams

Precise control of domain wall injection and pinning using helium and gallium focused ion beams

Holographic method for detecting amplitude and phase-shift errors and features in EUV ML reticle blanks

Novel nanosample preparation with a helium ion microscope

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