Nanogap Electrode Fabrication for a Nanoscale Device by Volume‐Expanding Electrochemical Synthesis

Kim, Ju-Hyun; Moon, Hee; Yoo, Seunghyup; Choi, Yang‐Kyu

doi:10.1002/smll.201002103

Cited by 15 publications

(23 citation statements)

References 40 publications

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“…Existing fabrication routes entail the use of electron-beam lithography3456, mechanical break junctions78, electrochemical deposition91011, oblique-angle shadow-evaporation12, scanning probe lithography13 or on-wire lithography14 to achieve intimate registration of the two electrodes. Such methods, however, variously suffer from low throughput, poor scalability to larger substrate sizes, complex multi-step processing protocols, and/or high equipment costs115.…”

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confidence: 99%

Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

et al. 2014

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Coplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography—a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.

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confidence: 99%

Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

et al. 2014

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“…Early forms of nanogaps were predominantly horizontal coplanar devices and a range of fabrication techniques exist, including: electron-beam lithography (EBL) [1,2], mechanical break junctions [3], focused ion beam (FIB) milling [4,5], oxidative plasma ablation [6], electromigration [7,8], electroplating [9], molecular rulers [10], chemical-mechanical polishing (CMP) [11] electrochemical synthesis [12], direct chemical synthesis [13], and dip-pen nanolithography (DPN) [14]. …”

Section: Introductionmentioning

confidence: 99%

Fabrication of a Horizontal and a Vertical Large Surface Area Nanogap Electrochemical Sensor

Hammond

Rosamond

Sivaraya

et al. 2016

Sensors

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Nanogap sensors have a wide range of applications as they can provide accurate direct detection of biomolecules through impedimetric or amperometric signals. Signal response from nanogap sensors is dependent on both the electrode spacing and surface area. However, creating large surface area nanogap sensors presents several challenges during fabrication. We show two different approaches to achieve both horizontal and vertical coplanar nanogap geometries. In the first method we use electron-beam lithography (EBL) to pattern an 11 mm long serpentine nanogap (215 nm) between two electrodes. For the second method we use inductively-coupled plasma (ICP) reactive ion etching (RIE) to create a channel in a silicon substrate, optically pattern a buried 1.0 mm × 1.5 mm electrode before anodically bonding a second identical electrode, patterned on glass, directly above. The devices have a wide range of applicability in different sensing techniques with the large area nanogaps presenting advantages over other devices of the same family. As a case study we explore the detection of peptide nucleic acid (PNA)−DNA binding events using dielectric spectroscopy with the horizontal coplanar device.

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“…Despite their importance, fabrication of sub‐5 nm NGEs remains a great technological challenge . Existing NGE‐manufacturing methods can be typically classified into two strategies: physical methods based on planar nanofabrication techniques and chemical methods based on noble metal nanoparticles. Most chemical methods are suitable for creating sub‐1 nm NGEs but limited to a relatively narrow range of applications owing to the contamination induced by linker molecules, the shell‐filled gaps, and/or the restrictions derived from metal nanoparticle size.…”

mentioning

confidence: 99%

“…Most chemical methods are suitable for creating sub‐1 nm NGEs but limited to a relatively narrow range of applications owing to the contamination induced by linker molecules, the shell‐filled gaps, and/or the restrictions derived from metal nanoparticle size. Physical methods, including direct patterning techniques, breaking‐/cracking‐based methods, and controllable deposition, are fundamentally limited by the basic planar nanofabrication techniques. Particularly, direct patterning techniques variously suffer from high equipment costs, low throughput, and poor scalability to large sizes.…”

mentioning

confidence: 99%

“…Though breaking‐based methods can be used to produce sub‐1 nm NGEs, the intrinsic obstacles mentioned above result in discrete and material‐limited NGEs with the fractal facing electrode surface blocking the realization of large‐scale complex systems. Controllable deposition is relatively simple for large‐scale fabrication, while the formed NGEs typically face limitations derived from large gap width, problematic rough surfaces, the solution environment, or/and contaminations from the shadow‐mask fabrication process. However, simply continuing to improve existing NGE‐fabricating methods is insufficient since each method has its own serious inherent defects.…”

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confidence: 99%

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Direct Deposited Angstrom‐Scale Nanogap Electrodes with Macroscopically Measurable and Material‐Independent Capabilities for Various Applications

Li¹,

Wang²,

Zhang³

et al. 2019

Adv Materials Technologies

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effects, quantum interference, nuclear spins, and electron tunneling, which can unlock the full potential of applications with high scientific and societal impact, including molecular electronics, [4][5][6][7][8][9] quantum tunneling, [10,11] plasmonic nano-optics, [12][13][14][15][16][17] and highly sensitive sequencing. [18][19][20] Despite their importance, fabrication of sub-5 nm NGEs remains a great technological challenge. [1] Existing NGEmanufacturing methods can be typically classified into two strategies: physical methods based on planar nanofabrication techniques and chemical methods based on noble metal nanoparticles. Most chemical methods are suitable for creating sub-1 nm NGEs [11][12][13][14][15] but limited to a relatively narrow range of applications owing to the contamination induced by linker molecules, the shell-filled gaps, and/or the restrictions derived from metal nanoparticle size. Physical methods, including direct patterning techniques, [21][22][23] breaking-/cracking-based methods, [6][7][8][9][10][16][17][18][19][20][24][25][26][27][28] and controllable deposition, [29][30][31] are fundamentally limited by the basic planar nanofabrication techniques. Particularly, direct patterning techniques variously suffer from high equipment costs, low throughput, and poor scalability to large sizes. The breaking-/cracking-based methods are the most widely used but typically involve direct patterning techniques to predefine the wire pattern, a complex apparatus to induce external stimuli, or special materials (e.g., brittle films) to induce internal stress. Though breaking-based methods can be used to produce sub-1 nm NGEs, [6][7][8][9][10][16][17][18][19][20] the intrinsic obstacles mentioned above result in discrete and material-limited NGEs with the fractal facing electrode surface blocking the realization of large-scale complex systems. Controllable deposition [29][30][31] is relatively simple for large-scale fabrication, while the formed NGEs typically face limitations derived from large gap width, problematic rough surfaces, the solution environment, or/and contaminations from the shadow-mask fabrication process. However, simply continuing to improve existing NGE-fabricating methods is insufficient since each method has its own serious inherent defects. An innovative approach is urgently needed to address these issues and to promote the developments of NGEs-based applications.Here, we demonstrate macroscopically measurable and material-independent NGEs with angstrom-scale separations Nanogap electrodes (NGEs) with decreasing separations have received growing attention due to their potential in stimulating extensive applications with high scientific impact, including molecular electronics, quantum tunneling, plasmonic optics, and highly sensitive sequencing. Although various NGE-manufacturing methods have been developed and offer promising results, angstrom-scale NGEs have not been achieved without requiring sophisticated equipment, restricting materials or substrates, compromising mass-fabric...

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Nanogap Electrode Fabrication for a Nanoscale Device by Volume‐Expanding Electrochemical Synthesis

Cited by 15 publications

References 40 publications

Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

Fabrication of a Horizontal and a Vertical Large Surface Area Nanogap Electrochemical Sensor

Direct Deposited Angstrom‐Scale Nanogap Electrodes with Macroscopically Measurable and Material‐Independent Capabilities for Various Applications

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