Nanoimprint combination techniques

Multilevel Hierarchical Topographies by Combined Photolithography and Nanoimprinting Processes To Create Surfaces with Controlled Wetting

“…In a second step, a photoresist layer is spin-coated on top of this layer and patterned by a second NIL process. The approach relays on the fact that conventional photoresins show in fact a thermoplastic behavior. , Lastly, photolithography of micrometer features is performed by maskless direct laser writing. After developing the photoresist, a hierarchical topography is revealed.…”

“…28 Capillary force nanoimprinting has been combined with UV lithography and deep UV flood exposure by the group of Scheer to produce a series of 3D and multilevel structures. 29 Two-scale hierarchical structures combining different microand nanoscale structures have been demonstrated by a twostep temperature-directed capillary molding process 30 or twostep UV-assisted capillary force lithography. 31 However, these processes require strict control of the processing parameters, particularly related to the interfacial forces and viscosity of the polymeric material.…”

Secondary Patternable UV-Imprinted Reworkable Resin by Additional Photoirradiation

“…The combination of UV-NIL and photolithography, one of the categories of hybrid lithography [9][10][11][12], enables us to fabricate complicated and 3D-shaped patterns [4][5][6][7][8]. Montague et al reported the first successful secondary patterning of UV imprint features by photolithography [11].…”

“…UV nanoimprint lithography (UV-NIL) has been extensively investigated due to the fabrication of not only nanopatterning for microelectronics but also functional materials for micro-electro-mechanical systems (MEMS) [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17]. UV-NIL utilizes UV light to cure a photoresist which was pressed using a patterned master mold to obtain the patterned structures.…”

“…During the fabrication process, UV-imprinted reworkable resins were degraded by the flood exposure of 254-nm light. In this study, we extended the exposure to the patterned exposures through a photomask to fabricate the second patterning [9][10][11][12] of the reworkable resins.…”