2012
DOI: 10.1002/pssa.201200887
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Nanoimprint lithography of textures for light trapping in thin film silicon solar cells

Abstract: Nanoimprint lithography (NIL) is a versatile and commercially viable technology for fabrication of structures for light trapping in solar cells. We demonstrate the applicability of NIL in thin film silicon solar cells in substrate configuration, where NIL is used to fabricate a textured rear contact of the solar cells. We applied random structures, based on the natural texture of SnO/ F grown by APCVD, and designed 2D periodic structures and show that for single junction mc-Si cells these textured rear contact… Show more

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Cited by 14 publications
(14 citation statements)
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“…For the cells reported in this paper we replicated the morphology of a master which has a periodic structure with a pitch of 1 µm and a peak‐to‐valley roughness of around 350 nm. The effectiveness of this morphology, which was optimized for use in a‐Si:H/nc‐Si:H tandem solar cells, with regards to improved current generation was shown in earlier work . Although this texture is not necessarily the optimum morphology for single junction a‐Si:H cells we used it to demonstrate the possibility of nanopatterning simultaneously with eliminating the porosity of the paper as a substrate.…”
Section: Resultsmentioning
confidence: 99%
“…For the cells reported in this paper we replicated the morphology of a master which has a periodic structure with a pitch of 1 µm and a peak‐to‐valley roughness of around 350 nm. The effectiveness of this morphology, which was optimized for use in a‐Si:H/nc‐Si:H tandem solar cells, with regards to improved current generation was shown in earlier work . Although this texture is not necessarily the optimum morphology for single junction a‐Si:H cells we used it to demonstrate the possibility of nanopatterning simultaneously with eliminating the porosity of the paper as a substrate.…”
Section: Resultsmentioning
confidence: 99%
“…Besides random, periodic textures have also shown potential to reach or even surpass optical properties of random textures if properly optimised [6][7][8][9][10][11]. Using interference or UV nano-imprint lithography large area superstrates/substrates including desired texture with high accuracy of desired texture shape can be made on large scale [12][13][14].…”
Section: Introductionmentioning
confidence: 99%
“…Besides random textures of transparent conductive oxides (such as SnO 2 :F [3], low pressure chemical vapour deposition-LP-CVD of ZnO:B [4], or magnetron sputtered ZnO:Al [5]) and nano-textured silver back contacts [6], artificial periodic textures have also gained much interest, showing the potential to match or even surpass the light trapping capabilities of random textures [7]. By using interference lithography, UV nano-imprint lithography, electroforming process for fabrication of large shims and UV embossing process, large area substrates with desired textures can be made on industrial scale [8][9][10].…”
Section: Introductionmentioning
confidence: 99%