2013
DOI: 10.1049/mnl.2012.0911
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Nanoimprinting of TiO 2 –SiO 2 photocurable materials with high titanium concentration for CF 4 /O 2 etch selectivity

Abstract: The nanofabrication of nanometre-scale multiple-level structures by nanoimprint lithography and CF 4 /O 2 etching rates was investigated for nanoelectro mechanical systems and three-dimensional (3D) wafer-level packaging. A TiO 2-SiO 2 sol-gel photocurable material with high titanium concentration of 20.9 wt% was developed for CF 4 /O 2 etch selectivity with a pattern transferring carbon layer in a bi-layer process. The nanostructures of 3D micropatterns, holes with 200 nm diameter and 130 nm-wide dense lines … Show more

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Cited by 5 publications
(2 citation statements)
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“…The phase and morphology of the samples were systematically characterised with analytical equipment [14][15][16][17][18][19][20][21][22][23][24]. The X-ray diffraction (XRD) patterns of the as-fabricated products were performed with a Rigaku MiniFlexII X-ray generator with Cu Kα radiation (λ = 1.54056 Å).…”
Section: Resultsmentioning
confidence: 99%
“…The phase and morphology of the samples were systematically characterised with analytical equipment [14][15][16][17][18][19][20][21][22][23][24]. The X-ray diffraction (XRD) patterns of the as-fabricated products were performed with a Rigaku MiniFlexII X-ray generator with Cu Kα radiation (λ = 1.54056 Å).…”
Section: Resultsmentioning
confidence: 99%
“…In relation to the above development and improvements, new nanoimprinted UV-curing liquid materials are required in addition to underlayer materials, imprinting equipment, large-area inkjet printing technology, and nonflat nanoimprint technology using nanoparticles, spherical structures, and others. 34,35) In particular, a nanoimprinted UV-curing liquid material derived from medicinal drugs or biomass is expected in the eco-friendly environmentally compatible nanofabrication and volume manufacture of biomicrochips.…”
Section: Introductionmentioning
confidence: 99%