2006
DOI: 10.1364/ol.31.003615
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Nanometer-scale ablation with a table-top soft x-ray laser

Abstract: Ablation of holes with diameters as small as 82 nm and very clean walls was obtained in poly(methyl methacrylate) focusing pulses from a Ne-like Ar 46.9 nm compact capillary-discharge laser with a freestanding Fresnel zone plate diffracting into third order. These results demonstrate the feasibility of using focused soft x-ray laser beams for the direct nanoscale patterning of materials and the development of new nanoprobes.

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Cited by 61 publications
(35 citation statements)
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(16 reference statements)
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“…In striking contrast, the application of the mixed XUV/Vis-NIR field resulted in clearly visible, irreversible surface modification after irradiation with only a few shots. The damage is characteristic due to material expansion, quite different from ablation craters observed in experiments with pure XUV pulses (Chalupsky et al, 2007;Juha et al, 2005;Vaschenko et al, 2006;Krzywinski et al, 2007;Mocek et al, 2006). A very interesting feature in Fig.…”
Section: Materials Surface Processingmentioning
confidence: 71%
“…In striking contrast, the application of the mixed XUV/Vis-NIR field resulted in clearly visible, irreversible surface modification after irradiation with only a few shots. The damage is characteristic due to material expansion, quite different from ablation craters observed in experiments with pure XUV pulses (Chalupsky et al, 2007;Juha et al, 2005;Vaschenko et al, 2006;Krzywinski et al, 2007;Mocek et al, 2006). A very interesting feature in Fig.…”
Section: Materials Surface Processingmentioning
confidence: 71%
“…Such lasers can enable fundamental studies and be utilized for applications such as nanomachining 14,15 and the development of nanoprobes. [16][17][18] We present the results of experiments undertaken with an argon capillary discharge laser, producing nanosecond pulses at a wavelength of 46.9 nm, focused onto thin parylene-N targets.…”
Section: Introductionmentioning
confidence: 99%
“…Considerable advances have been made in higher fluence EUV and x-ray laser technology as demonstrated by free-electron lasers [1,2] and capillary discharge lasers [3,4]. With higher fluences now available, EUV and x-ray lasers can be used to directly generate strongly coupled plasma.…”
Section: Introductionmentioning
confidence: 99%